Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AR | P10275 | 3/20 | 0.44 |
| ▸ | TEAD4 | Q15561 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.42 |
| ▸ | POLB | P06746 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 1/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
| ▸ | MEN1 | O00255 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
| ▸ | ESRRA | P11474 | 1/20 | 0.40 |
| ▸ | HTR2A | P28223 | 5/20 | 0.40 |
| ▸ | SLC6A4 | P31645 | 5/20 | 0.40 |
| ▸ | KCNH2 | Q12809 | 3/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | ACHE | P22303 | 1/20 | 0.39 |
| ▸ | GAA | P10253 | 2/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 2/20 | 0.39 |
| ▸ | TP53 | P04637 | 1/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14865712 | 0.91 | TEAD4 (0.60) | ARTEAD4ALDH1A1POLBMAPT | |
| SCHEMBL14027216 | 0.90 | AR (0.47) | ARTEAD4ALDH1A1POLBMAPT | |
| SCHEMBL14586631 | 0.83 | TSHR (0.47) | ARTEAD4ALDH1A1POLBMAPT | |
| SCHEMBL7044340 | 0.82 | ALDH1A1 (0.39) | ARTEAD4ALDH1A1POLBMAPT | |
| SCHEMBL23089047 | 0.82 | ALDH1A1 (0.53) | ALDH1A1MEN1KMT2AESRRAGAA | |
| SCHEMBL1353357 | 0.82 | ALDH1A1 (0.57) | TEAD4ALDH1A1POLBMAPTTDP1 | |
| SCHEMBL11597350 | 0.81 | RIPK1 (0.48) | ALDH1A1KMT2ASLC6A4TSHRGAA | |
| SCHEMBL14296259 | 0.80 | HTR2A (0.45) | ARALDH1A1MAPTTDP1MEN1 | |
| SCHEMBL28573249 | 0.80 | TEAD4 (0.45) | ARTEAD4ALDH1A1POLBMAPT | |
| SCHEMBL6061341 | 0.80 | ACHE (0.47) | ARALDH1A1MAPTTDP1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220291585-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR POLYIMIDE, PRODUCTION METHOD FOR CURED RELIEF PATTERN, AND SEMICONDUCTOR DEVICE | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2022-09-15 | — | — | US | disclosed |
| US-11319410-B2 | Precursor for polyimide and use thereof | ETERNAL MATERIALS CO., LTD. (TW) | 2022-05-03 | — | — | US | disclosed |
| US-11034797-B2 | Polyimide precursor composition, use thereof and polyimide made therefrom | ETERNAL MATERIALS CO., LTD. (TW) | 2021-06-15 | — | — | US | disclosed |
| US-20210079161-A1 | POLYIMIDE PRECURSOR COMPOSITION, USE THEREOF AND POLYIMIDE MADE THEREFROM | ETERNAL MATERIALS CO., LTD. (TW) | 2021-03-18 | — | — | US | disclosed |
| WO-2021020463-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR POLYIMIDE, PRODUCTION METHOD FOR CURED RELIEF PATTERN, AND SEMICONDUCTOR DEVICE | 旭化成株式会社 | 2021-02-04 | — | — | WO | disclosed |
| US-10731004-B2 | Polyimide precursor composition and use thereof | ETERNAL MATERIALS CO., LTD. (TW) | 2020-08-04 | — | — | US | disclosed |
| US-10696793-B2 | Process for preparing polyimides | ETERNAL MATERIALS CO., LTD. (TW) | 2020-06-30 | — | — | US | disclosed |
| US-10639876-B2 | Solvent-containing dry film and method for applying the same on a substrate | ETERNAL MATERIALS CO., LTD. (TW) | 2020-05-05 | — | — | US | disclosed |
| US-10626220-B2 | Precursor for polyimide and use thereof | ETERNAL MATERIALS CO., LTD. (TW) | 2020-04-21 | — | — | US | disclosed |
| US-20200055986-A1 | PROCESS FOR PREPARING POLYIMIDES | ETERNAL MATERIALS CO., LTD. (TW) | 2020-02-20 | — | — | US | disclosed |
| US-8105752-B2 | Photosensitive polyimides | ETERNAL CHEMICAL CO., LTD. (TW) | 2012-01-31 | — | — | US | disclosed |
| US-8105752-B2 | Photosensitive polyimides | ETERNAL CHEMICAL CO., LTD. (TW) | 2012-01-31 | — | — | US | disclosed |
| US-20110212402-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND ITS APPLICATION | ETERNAL CHEMICAL CO., LTD. (TW) | 2011-09-01 | — | — | US | disclosed |
| US-20110212402-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND ITS APPLICATION | ETERNAL CHEMICAL CO., LTD. (TW) | 2011-09-01 | — | — | US | disclosed |
| US-20100086874-A1 | Photosensitive polymides | ETERNAL CHEMICAL CO., LTD. (TW) | 2010-04-08 | — | — | US | disclosed |
| US-20100086874-A1 | Photosensitive polymides | ETERNAL CHEMICAL CO., LTD. (TW) | 2010-04-08 | — | — | US | disclosed |
| US-20100086871-A1 | PHOTOSENSITIVE POLYIMIDES | ETERNAL CHEMICAL CO., LTD. | 2010-04-08 | — | — | US | disclosed |
| US-20100086871-A1 | PHOTOSENSITIVE POLYIMIDES | ETERNAL CHEMICAL CO., LTD. | 2010-04-08 | — | — | US | disclosed |
| US-20090181324-A1 | PHOTOSENSITIVE POLYIMIDES | ETERNAL CHEMICAL CO., LTD. | 2009-07-16 | — | — | US | disclosed |
| US-20090181324-A1 | PHOTOSENSITIVE POLYIMIDES | ETERNAL CHEMICAL CO., LTD. | 2009-07-16 | — | — | US | disclosed |