Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | NPC1 | O15118 | 1/20 | 0.30 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | PKM | P14618 | 1/20 | 0.30 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
| ▸ | RECQL | P46063 | 1/20 | 0.30 |
| ▸ | RAB9A | P51151 | 1/20 | 0.30 |
| ▸ | ATM | Q13315 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19062654 | 0.85 | GPX4 (0.35) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL25617837 | 0.85 | GPX4 (0.35) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL75422 | 0.85 | GPX4 (0.35) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL12510374 | 0.82 | ABCB1 (0.31) | — | |
| SCHEMBL12430032 | 0.81 | CYP3A4 (0.34) | KDM4EMAPT | |
| SCHEMBL438899 | 0.81 | — | — | |
| SCHEMBL13370892 | 0.80 | — | — | |
| SCHEMBL17166862 | 0.80 | — | — | |
| SCHEMBL18793138 | 0.79 | — | — | |
| SCHEMBL686265 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2186838-B1 | METHOD FOR PRODUCING STAR POLYMER | NIPPON SODA CO (JP) | 2014-08-27 | — | — | EP | disclosed |
| EP-1892255-B1 | ACRYLIC ACID POLYMER | NIPPON SODA CO (JP) | 2012-08-01 | — | — | EP | disclosed |
| US-8193286-B2 | Acrylic star polymer | NIPPON SODA CO., LTD. (JP) | 2012-06-05 | — | — | US | disclosed |
| US-8193286-B2 | Acrylic star polymer | NIPPON SODA CO., LTD. (JP) | 2012-06-05 | — | — | US | disclosed |
| US-8067515-B2 | Method of producing an acrylic acid-based polymer | NIPPON SODA CO., LTD. (JP) | 2011-11-29 | — | — | US | disclosed |
| US-8067515-B2 | Method of producing an acrylic acid-based polymer | NIPPON SODA CO., LTD. (JP) | 2011-11-29 | — | — | US | disclosed |
| US-20110098413-A1 | Acrylic star polymer | NIPPON SODA CO., LTD (JP) | 2011-04-28 | — | — | US | disclosed |
| US-20110098413-A1 | Acrylic star polymer | NIPPON SODA CO., LTD (JP) | 2011-04-28 | — | — | US | disclosed |
| US-20110046333-A1 | ACRYLIC ACID-BASED POLYMER AND METHOD OF PRODUCING THE SAME | NIPPON SODA CO., LTD. (JP) | 2011-02-24 | — | — | US | disclosed |
| US-20110046333-A1 | ACRYLIC ACID-BASED POLYMER AND METHOD OF PRODUCING THE SAME | NIPPON SODA CO., LTD. (JP) | 2011-02-24 | — | — | US | disclosed |
| US-20100210805-A1 | METHOD FOR PRODUCING STAR POLYMER | NIPPON SODA CO., LTD. (JP) | 2010-08-19 | — | — | US | disclosed |
| US-20090209726-A1 | ACRYLIC STAR POLYMER | NIPPON SODA CO., LTD. (JP) | 2009-08-20 | — | — | US | disclosed |
| US-20090209726-A1 | ACRYLIC STAR POLYMER | NIPPON SODA CO., LTD. (JP) | 2009-08-20 | — | — | US | disclosed |
| US-20090111961-A1 | Acrylic Acid-Based Polymer and Method of Producing the Same | NIPPON SODA CO., LTD. (JP) | 2009-04-30 | — | — | US | disclosed |
| US-20090111961-A1 | Acrylic Acid-Based Polymer and Method of Producing the Same | NIPPON SODA CO., LTD. (JP) | 2009-04-30 | — | — | US | disclosed |
| US-7494759-B2 | Positive resist compositions and process for the formation of resist patterns with the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-02-24 | — | — | US | disclosed |
| US-7494759-B2 | Positive resist compositions and process for the formation of resist patterns with the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-02-24 | — | — | US | disclosed |
| US-20070224538-A1 | Positive Resist Compositions and Process for the Formation of Resist Patterns With the Same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-09-27 | — | — | US | disclosed |
| US-20070224538-A1 | Positive Resist Compositions and Process for the Formation of Resist Patterns With the Same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-09-27 | — | — | US | disclosed |
| EP-1752479-A1 | ACRYLIC STAR POLYMER | NIPPON SODA CO., LTD. (JP) | 2007-02-14 | — | — | EP | disclosed |