Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | GAA | P10253 | 3/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | CA12 | O43570 | 1/20 | 0.31 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | CA9 | Q16790 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | PKM | P14618 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12125200 | 0.91 | TSHR (0.34) | KDM4EKMT2AL3MBTL1GAAHPGD | |
| SCHEMBL10027979 | 0.77 | KDM4E (0.57) | KDM4EKMT2AL3MBTL1GAAALDH1A1 | |
| SCHEMBL12125202 | 0.75 | P2RX4 (0.31) | — | |
| SCHEMBL133380 | 0.74 | NLRP3 (0.32) | — | |
| SCHEMBL11986000 | 0.74 | NLRP3 (0.32) | — | |
| SCHEMBL112073 | 0.70 | HMGCR (0.33) | KDM4EKMT2AALDH1A1MAPK1SMN1; SMN2 | |
| SCHEMBL13222983 | 0.69 | — | — | |
| SCHEMBL12973908 | 0.69 | NLRP3 (0.37) | — | |
| SCHEMBL13759736 | 0.69 | SOAT1 (0.30) | — | |
| SCHEMBL13759732 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120021357-A1 | POSITIVE-TYPE PHOTOSENSITIVE INSULATING RESIN COMPOSITION, AND PATTERN FORMING METHOD USING SAME | NEC CORPORATION (JP) | 2012-01-26 | — | — | US | disclosed |