SCHEMBL10033496

SCHEMBL10033496

C=CC(=O)OCCNC(=O)OCCOC(=O)C(C)CC

nearest known ligand 0.42

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ACHE P22303 8/20 0.42
TSHR P16473 7/20 0.42
HPGD P15428 1/20 0.42
ALDH1A1 P00352 3/20 0.42
TP53 P04637 2/20 0.42
HIF1A Q16665 2/20 0.42
HSD17B10 Q99714 1/20 0.42
THRB P10828 1/20 0.40
CYP3A4 P08684 1/20 0.39
CHRNB2 P17787 2/20 0.38
CHRNB4 P30926 2/20 0.38
CHRNA3 P32297 2/20 0.38
CHRNA4 P43681 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10033565 0.96 TSHR (0.50) ACHETSHRHPGDALDH1A1TP53
SCHEMBL11920493 0.94 TSHR (0.47) ACHETSHRHPGDALDH1A1CYP3A4
SCHEMBL25784333 0.94 TSHR (0.47) ACHETSHRHPGDALDH1A1CYP3A4
SCHEMBL25784316 0.93 TSHR (0.50) ACHETSHRHPGDALDH1A1TP53
SCHEMBL25784317 0.92 ACHE (0.47) ACHETSHRHPGDALDH1A1TP53
SCHEMBL27135132 0.89 ACHE (0.44) ACHETSHRHPGDALDH1A1TP53
SCHEMBL13130542 0.89 TSHR (0.42) ACHETSHRHPGDALDH1A1TP53
SCHEMBL10033568 0.88 TSHR (0.42) ACHETSHRHPGDALDH1A1CYP3A4
SCHEMBL12455811 0.87 ZDHHC20 (0.41) ACHETSHRALDH1A1CHRNB2CHRNB4
SCHEMBL10033520 0.86 TSHR (0.55) TSHRHPGDALDH1A1TP53HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230265346-A1 LIQUID CRYSTAL COMPOSITION, OPTICALLY ANISOTROPIC LAYER, LAMINATE, AND IMAGE DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2023-08-24 US disclosed
US-20230217718-A1 METHOD FOR PRODUCING LIGHT-EMITTING ELEMENTS CENTRAL GLASS COMPANY, LIMITED (JP) 2023-07-06 US disclosed
US-20230143665-A1 FLUORINE-CONTAINING POLYMER, COMPOSITION, OPTICAL FILM, LIQUID CRYSTAL FILM, HARDCOAT FILM, AND POLARIZING PLATE FUJIFILM CORPORATION (JP) 2023-05-11 US disclosed
US-9296904-B2 Coating compositions comprising non-ionic surfactant exhibiting reduced fingerprint visibility 3M INNOVATIVE PROPERTIES COMPANY (US) 2016-03-29 US disclosed
US-9296904-B2 Coating compositions comprising non-ionic surfactant exhibiting reduced fingerprint visibility 3M INNOVATIVE PROPERTIES COMPANY (US) 2016-03-29 US disclosed
US-8714088-B2 Lithographic printing plate precursor and lithographic printing method FUJIFILM CORPORATION (JP) 2014-05-06 US disclosed
US-8551676-B2 Pigment-dispersed composition, curable composition, and color filter and production method thereof FUJIFILM CORPORATION (JP) 2013-10-08 US disclosed
US-8436069-B2 Ink composition FUJIFILM CORPORATION (JP) 2013-05-07 US disclosed
US-8299142-B2 Ink composition, inkjet recording method, and printed article FUJIFILM CORPORATION (JP) 2012-10-30 US disclosed
US-20120270980-A1 COATING COMPOSITIONS COMPRISING NON-IONIC SURFACTANT EXHIBITING REDUCED FINGERPRINT VISIBILITY 3M INNOVATIVE PROPERTIES COMPANY 2012-10-25 US disclosed
US-20100080893-A1 METHOD OF FORMING METAL FILM FUJIFILM CORPORATION (JP) 2010-04-01 US disclosed
US-20100071828-A1 METHOD OF PRODUCING MULTILAYER STRUCTURE FUJIFILM CORPORATION (JP) 2010-03-25 US disclosed
US-20100003533-A1 METAL-FILM-COATED MATERIAL AND PROCESS FOR PRODUCING THE SAME, METALLIC-PATTERN-BEARING MATERIAL AND PROCESS FOR PRODUCING THE SAME, COMPOSITION FOR POLYMER LAYER FORMATION, NITRILE GROUP-CONTAINING POLYMER AND METHOD OF SYNTHESIZING THE SAME, COMPOSITION CONTAINING NITRILE GROUP-CONTAINING POLYMER, AND LAMINATE FUJIFILM CORPORATION (JP) 2010-01-07 US disclosed
US-20090269599-A1 MULTILAYER FILM FOR PLATING, METHOD OF MANUFACTURING METAL FILM-COATED MATERIAL AND METAL FILM-COATED MATERIAL FUJIFILM CORPORATION (JP) 2009-10-29 US disclosed
US-20090266583-A1 PHOTOSENSITIVE RESIN COMPOSITION, LAMINATE, METHOD OF PRODUCING METAL PLATED MATERIAL, METAL PLATED MATERIAL, METHOD OF PRODUCING METAL PATTERN MATERIAL, METAL PATTERN MATERIAL AND WIRING SUBSTRATE FUJIFILM CORPORATION (JP) 2009-10-29 US disclosed
US-20090214876-A1 METAL-FILM-COATED MATERIAL AND PROCESS FOR PRODUCING THE SAME, METALLIC-PATTERN-BEARING MATERIAL AND PROCESS FOR PRODUCING THE SAME, COMPOSITION FOR POLYMER LAYER FORMATION, NITRILE GROUP-CONTAINING POLYMER AND METHOD OF SYNTHESIZING THE SAME, COMPOSITION CONTAINING NITRILE GROUP-CONTAINING POLYMER, AND LAMINATE FUJIFILM CORPORATION (JP) 2009-08-27 US disclosed
US-20090197055-A1 Ink composition, inkjet recording method, and printed article FUJIFILM CORPORATION (JP) 2009-08-06 US disclosed
US-20090155553-A1 Method of manufacturing surface metal film material, surface metal film material, method of manufacturing patterned metal material, patterned metal material, and polymer layer-forming composition FUJIFILM CORPORATION (JP) 2009-06-18 US disclosed
US-20090114108-A1 LITHOGRAPHIC PRINTING PLATE PRECURSOR AND LITHOGRAPHIC PRINTING METHOD FUJIFILM CORPORATION (JP) 2009-05-07 US disclosed
US-20090023831-A1 Curable Composition Containing Thiol Compound SHOWA DENKO K.K. (JP) 2009-01-22 US disclosed