SCHEMBL10044449

SCHEMBL10044449

CCc1cc(OC)cc(C)c1OC

nearest known ligand 0.61

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
DHFR P00374 1/20 0.43
CYP3A4 P08684 2/20 0.42
HPGD P15428 2/20 0.42
CYP1A2 P05177 1/20 0.42
ALDH1A1 P00352 2/20 0.41
HTR2A P28223 1/20 0.40
FFAR4 Q5NUL3 1/20 0.40
PTPN1 P18031 2/20 0.39
PTGS2 P35354 1/20 0.38
ELANE P08246 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2945602 0.87 ALDH1A1 (0.48) CYP1A2ALDH1A1HTR2APTGS2
SCHEMBL10729669 0.82 CYP1A2 (0.41) CYP3A4HPGDCYP1A2ALDH1A1FFAR4
SCHEMBL9513058 0.82 CYP1A2 (0.41) CYP3A4HPGDCYP1A2ALDH1A1FFAR4
SCHEMBL10734341 0.82 MAPT (0.46) CYP3A4HPGDCYP1A2ALDH1A1PTPN1
SCHEMBL12925519 0.81 CYP3A4 (0.43) CYP3A4HPGDCYP1A2ALDH1A1HTR2A
SCHEMBL13310100 0.81 DHFR (0.44) DHFRALDH1A1PTGS2
SCHEMBL2955343 0.79 ALDH1A1 (0.56) CYP3A4HPGDCYP1A2ALDH1A1FFAR4
SCHEMBL10044958 0.79 CYP1A2 (0.65) CYP3A4CYP1A2ALDH1A1HTR2APTGS2
SCHEMBL10477447 0.78 CYP3A4 (0.41) CYP3A4HPGDCYP1A2ALDH1A1FFAR4
SCHEMBL16546632 0.78 CYP3A4 (0.49) CYP3A4HPGDALDH1A1FFAR4PTPN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2012052420-A1 METHOD FOR PREPARING SUBSTITUTED N-(3-AMINO-QUINOXALIN-2-YL)-SULFONAMIDES AND THEIR INTERMEDIATES N-(3-CHLORO-QUINOXALIN-2-YL)SULFONAMIDES MERCK SERONO S.A. GENEVA (CH) 2012-04-26 WO disclosed
US-20100285407-A1 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-11 US disclosed