SCHEMBL10049486

SCHEMBL10049486

C=COCCOC(=O)c1ccc(C(C)CC)cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.42
ALDH1A1 P00352 4/20 0.42
TDP1 Q9NUW8 2/20 0.42
ESR1 P03372 2/20 0.42
CHRM1 P11229 1/20 0.42
SLC6A2 P23975 1/20 0.42
KDR P35968 1/20 0.42
MAPT P10636 2/20 0.41
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
LMNA P02545 3/20 0.40
SMN1; SMN2 Q16637 2/20 0.40
CYP1A2 P05177 2/20 0.40
CYP2C19 P33261 2/20 0.40
MAPK1 P28482 2/20 0.40
CYP2D6 P10635 1/20 0.40
NR1H2 P55055 1/20 0.40
RNASEL Q05823 1/20 0.40
CYP3A4 P08684 1/20 0.39
CYP2C9 P11712 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10033550 0.96 CYP3A4 (0.43) TSHRALDH1A1TDP1ESR1CHRM1
SCHEMBL14565941 0.86 THRB (0.42) TSHRALDH1A1TDP1ESR1CHRM1
SCHEMBL10089271 0.85 CYP3A4 (0.49) TSHRALDH1A1TDP1ESR1CHRM1
SCHEMBL6067577 0.83 ESR1 (0.47) TSHRALDH1A1TDP1ESR1CHRM1
SCHEMBL18309253 0.82 CYP3A4 (0.55) TSHRALDH1A1TDP1ESR1CHRM1
SCHEMBL14094425 0.82 CYP3A4 (0.55) TSHRALDH1A1TDP1ESR1CHRM1
SCHEMBL25784278 0.81 TSHR (0.46) TSHRALDH1A1TDP1ESR1CHRM1
SCHEMBL25784268 0.81 THRB (0.44) TSHRALDH1A1TDP1ESR1CHRM1
SCHEMBL14022183 0.80 ESR1 (0.64) TSHRALDH1A1TDP1ESR1CHRM1
SCHEMBL13567324 0.79 RAB9A (0.47) TSHRALDH1A1TDP1ESR1CHRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8202576-B2 Method of forming metal film FUJIFILM CORPORATION (JP) 2012-06-19 US disclosed
US-20100080893-A1 METHOD OF FORMING METAL FILM FUJIFILM CORPORATION (JP) 2010-04-01 US disclosed