Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL1005215

CN(C)c1ccccc1.O=S(=O)(O)C(F)(F)F

nearest known ligand 0.46

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.46
MEN1 O00255 3/20 0.46
KMT2A Q03164 3/20 0.46
RAB9A P51151 2/20 0.46
HPGD P15428 2/20 0.46
NPC1 O15118 1/20 0.46
NR1H3 Q13133 4/20 0.44
NR1H2 P55055 2/20 0.41
TSHR P16473 2/20 0.39
HSD17B10 Q99714 2/20 0.39
MAPK1 P28482 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
RELA Q04206 1/20 0.39
PTGS1 P23219 1/20 0.39
PTGS2 P35354 1/20 0.39
CA12 O43570 1/20 0.39
CA2 P00918 1/20 0.39
CA9 Q16790 1/20 0.39
GFER P55789 1/20 0.39
HTT P42858 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20490012 0.90 ALDH1A1 (0.45) ALDH1A1MEN1KMT2ARAB9AHPGD
Sulfuric Acid SCHEMBL4958447 0.85 HPGD (0.54) ALDH1A1MEN1KMT2ARAB9AHPGD
Trifluoromethanesulfonic Acid SCHEMBL1005212 0.83 ALDH1A1 (0.41) ALDH1A1MEN1KMT2ANR1H3NR1H2
Sulfuric Acid SCHEMBL6015107 0.83 HPGD (0.52) ALDH1A1MEN1KMT2ARAB9AHPGD
Trifluoromethanesulfonic Acid SCHEMBL6423653 0.82 ALDH1A1 (0.58) ALDH1A1MEN1KMT2ARAB9AHPGD
Sulfuric Acid SCHEMBL11329666 0.81 RAB9A (0.50) ALDH1A1MEN1KMT2ARAB9AHPGD
Trifluoromethanesulfonic Acid SCHEMBL4575017 0.81 ALDH1A1 (0.41) ALDH1A1MEN1KMT2ARAB9AHPGD
SCHEMBL1878988 0.81 ALDH1A1 (0.41) ALDH1A1MEN1KMT2ARAB9AHPGD
Trifluoromethanesulfonic Acid SCHEMBL1377208 0.81 CHRM5 (0.59) ALDH1A1MEN1KMT2ARAB9AHPGD
Trifluoromethanesulfonic Acid SCHEMBL29064747 0.80 TSHR (0.44) ALDH1A1MEN1KMT2ANR1H3NR1H2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118103775-A Composition for forming resist underlayer film 日产化学株式会社 2024-05-28 CN disclosed
CN-114316137-A High refractive index materials 罗门哈斯电子材料有限责任公司 2022-04-12 CN disclosed
CN-107267039-B Coating compositions for use with an overcoated photoresist 罗门哈斯电子材料韩国有限公司 2020-07-07 CN disclosed
US-20110033716-A1 GAS-BARRIER COMPOSITION, COATING FILM, PROCESS FOR PRODUCING THE SAME, AND LAYERED MATERIAL MITSUI CHEMICALS, INC. (JP) 2011-02-10 US disclosed
US-7879947-B2 Gas-barrier composition, coating film and method for production of the same, and layered material MITSUI CHEMICALS, INC. (JP) 2011-02-01 US disclosed
EP-2277954-A1 GAS BARRIER COMPOSITION, COATING FILM, METHOD FOR PRODUCING THE GAS BARRIER COMPOSITION, METHOD FOR PRODUCING THE COATING FILM, AND MULTILAYER BODY Mitsui Chemicals, Inc. (JP) 2011-01-26 EP disclosed
US-20090171003-A1 Gas-barrier composition, coating film and method for production of the same, and layered material MITSUI CHEMICALS, INC. (JP) 2009-07-02 US disclosed
US-7524900-B2 Gas-barrier composition, coating film and method for production of the same, and layered material MITSUI CHEMICALS, INC. (JP) 2009-04-28 US disclosed
EP-1894971-A1 GAS BARRIER COMPOSITION, COATING FILM, METHODS FOR PRODUCING THOSE, AND MULTILAYER BODY Mitsui Chemicals, Inc. (JP) 2008-03-05 EP disclosed
US-20060293448-A1 Gas-barrier composition, coating film and method for production of the same, and layered material MITSUI CHEMICALS, INC. (JP) 2006-12-28 US disclosed
US-20050215713-A1 Method of producing a crosslinked coating in the manufacture of integrated circuits KING INDUSTRIES, INC. 2005-09-29 US disclosed
EP-0485989-B1 Room-temperature curable resin composition containing acrylic polymer having alicyclic epoxide functions NIPPON PAINT CO LTD (JP) 1996-02-07 EP disclosed
US-5212252-A Coatings, sealants NIPPON PAINT CO., LTD. (JP) 1993-05-18 US disclosed
EP-0485989-A2 Room-temperature curable resin composition containing acrylic polymer having alicyclic epoxide functions NIPPON PAINT CO., LTD. (JP) 1992-05-20 EP disclosed