Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TAS1R3 | Q7RTX0 | 2/20 | 0.35 |
| ▸ | TAS1R1 | Q7RTX1 | 2/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.35 |
| ▸ | SCN1A | P35498 | 2/20 | 0.33 |
| ▸ | SCN2A | Q99250 | 2/20 | 0.33 |
| ▸ | SCN3A | Q9NY46 | 2/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.32 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.32 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL471779 | 0.95 | SMN1; SMN2 (0.38) | TAS1R3TAS1R1SMN1; SMN2SCN1ASCN2A | |
| SCHEMBL10053096 | 0.90 | KDM2B (0.32) | MEN1KMT2A | |
| SCHEMBL472300 | 0.85 | CYP2D6 (0.33) | SMN1; SMN2MEN1KMT2A | |
| SCHEMBL10021856 | 0.84 | CYP2D6 (0.32) | SMN1; SMN2MEN1KMT2A | |
| SCHEMBL10021861 | 0.83 | ALDH1A1 (0.32) | SMN1; SMN2MEN1KMT2A | |
| SCHEMBL10021857 | 0.83 | ALDH1A1 (0.32) | SMN1; SMN2MEN1KMT2A | |
| SCHEMBL10021858 | 0.82 | ALDH1A1 (0.38) | L3MBTL1MEN1KMT2A | |
| SCHEMBL10053742 | 0.82 | SMN1; SMN2 (0.40) | TAS1R3TAS1R1SMN1; SMN2SCN1ASCN2A | |
| SCHEMBL10053106 | 0.81 | SMN1; SMN2 (0.34) | SMN1; SMN2SCN1ASCN2ASCN3A | |
| SCHEMBL17936646 | 0.78 | SERPINE1 (0.38) | SMN1; SMN2SCN1ASCN2ASCN3AMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8470512-B2 | Polymer, chemically amplified negative resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-06-25 | — | — | US | disclosed |
| US-20120028190-A1 | POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-02-02 | — | — | US | disclosed |