Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2D6 | P10635 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.32 |
| ▸ | MEN1 | O00255 | 2/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | KDM2B | Q8NHM5 | 3/20 | 0.31 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.31 |
| ▸ | LGALS9 | O00182 | 1/20 | 0.30 |
| ▸ | LGALS8 | O00214 | 1/20 | 0.30 |
| ▸ | LGALS1 | P09382 | 1/20 | 0.30 |
| ▸ | LGALS3 | P17931 | 1/20 | 0.30 |
| ▸ | LGALS7; LGALS7B | P47929 | 1/20 | 0.30 |
| ▸ | HTR2C | P28335 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10021861 | 0.98 | ALDH1A1 (0.32) | CYP2D6ALDH1A1KMT2AMEN1SMN1; SMN2 | |
| SCHEMBL10021857 | 0.98 | ALDH1A1 (0.32) | CYP2D6ALDH1A1KMT2AMEN1SMN1; SMN2 | |
| SCHEMBL10021856 | 0.97 | CYP2D6 (0.32) | CYP2D6ALDH1A1KMT2AMEN1SMN1; SMN2 | |
| SCHEMBL10053096 | 0.96 | KDM2B (0.32) | CYP2D6ALDH1A1KMT2AMEN1KDM2B | |
| SCHEMBL471779 | 0.89 | SMN1; SMN2 (0.38) | CYP2D6ALDH1A1KMT2AMEN1SMN1; SMN2 | |
| SCHEMBL10021858 | 0.87 | ALDH1A1 (0.38) | ALDH1A1KMT2AMEN1 | |
| SCHEMBL10053102 | 0.85 | TAS1R3 (0.35) | KMT2AMEN1SMN1; SMN2 | |
| SCHEMBL10021864 | 0.83 | ALDH1A1 (0.33) | ALDH1A1KMT2AMEN1HRH3LGALS9 | |
| SCHEMBL10021863 | 0.82 | KDM2B (0.33) | CYP2D6ALDH1A1KMT2AMEN1KDM2B | |
| SCHEMBL10021859 | 0.80 | MEN1 (0.32) | CYP2D6ALDH1A1KMT2AMEN1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2413192-B1 | POLYMERIZABLE MONOMERS | SHINETSU CHEMICAL CO (JP) | 2016-12-21 | — | — | EP | disclosed |
| EP-2412733-B1 | Polymer, chemically amplified negative resist composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2016-03-23 | — | — | EP | disclosed |
| EP-2412733-B1 | Polymer, chemically amplified negative resist composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2016-03-23 | — | — | EP | disclosed |
| US-8501942-B2 | Polymerizable monomers | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-06 | — | — | US | disclosed |
| US-8501942-B2 | Polymerizable monomers | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-06 | — | — | US | disclosed |
| US-8470512-B2 | Polymer, chemically amplified negative resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-06-25 | — | — | US | disclosed |
| US-8470512-B2 | Polymer, chemically amplified negative resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-06-25 | — | — | US | disclosed |
| US-20120028190-A1 | POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-02-02 | — | — | US | disclosed |
| US-20120028190-A1 | POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-02-02 | — | — | US | disclosed |
| US-20120029193-A1 | POLYMERIZABLE MONOMERS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-02-02 | — | — | US | disclosed |
| US-20120029193-A1 | POLYMERIZABLE MONOMERS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-02-02 | — | — | US | disclosed |
| EP-2413192-A1 | Polymerizable monomers | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-02-01 | — | — | EP | disclosed |
| EP-2412733-A1 | Polymer, chemically amplified negative resist composition, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-02-01 | — | — | EP | disclosed |
| EP-2412733-A1 | Polymer, chemically amplified negative resist composition, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-02-01 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120029193-A1 | POLYMERIZABLE MONOMERS | C9, CCNA1, H1-0 | CYP2D6 2072/4885ALDH1A1 619/4885KMT2A 2389/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.