Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAOA | P21397 | 15/20 | 0.44 |
| ▸ | MAOB | P27338 | 14/20 | 0.44 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.43 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.43 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.42 |
| ▸ | GAA | P10253 | 1/20 | 0.42 |
| ▸ | HTT | P42858 | 1/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10064135 | 0.88 | MAPT (0.50) | MAOAMAOBHDAC4HDAC2HDAC8 | |
| SCHEMBL18704854 | 0.86 | MAOA (0.46) | MAOAMAOBCYP3A4 | |
| SCHEMBL14726021 | 0.83 | MAOA (0.50) | MAOAMAOBALDH1A1GAACYP3A4 | |
| SCHEMBL7879420 | 0.78 | MAOA (0.42) | MAOAMAOBCYP3A4 | |
| SCHEMBL26057140 | 0.76 | HDAC4 (0.41) | MAOAMAOBHDAC4HDAC2HDAC8 | |
| SCHEMBL6056909 | 0.76 | HDAC4 (0.42) | MAOAMAOBHDAC4HDAC2HDAC8 | |
| SCHEMBL4889560 | 0.74 | ALDH1A1 (0.46) | HDAC4HDAC2HDAC8ALDH1A1GAA | |
| SCHEMBL19770243 | 0.74 | MAPT (0.49) | MAOAMAOBALDH1A1GAACYP3A4 | |
| SCHEMBL5094360 | 0.74 | MAPT (0.46) | MAOAMAOBALDH1A1GAACYP3A4 | |
| SCHEMBL14177758 | 0.74 | HDAC4 (0.39) | HDAC4HDAC2HDAC8ALDH1A1GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8623590-B2 | Pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-01-07 | — | — | US | disclosed |
| US-20120108043-A1 | PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-03 | — | — | US | disclosed |
| US-7374860-B2 | Positive resist composition and pattern forming method using the same | FUJI FILM CORPORATION (JP) | 2008-05-20 | — | — | US | disclosed |