SCHEMBL100643

SCHEMBL100643

OCC(O)CCCC(O)CO

nearest known ligand 0.62

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.62
LMNA P02545 3/20 0.57
ALDH1A1 P00352 1/20 0.57
USP2 O75604 3/20 0.41
CYP3A4 P08684 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
TDP1 Q9NUW8 2/20 0.35
MAPT P10636 1/20 0.33
ATM Q13315 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
ACACB O00763 1/20 0.32
ACACA Q13085 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1164867 0.92 THRB (0.62) THRBLMNAALDH1A1USP2CYP3A4
SCHEMBL1284760 0.90 THRB (0.53) THRBLMNAALDH1A1USP2CYP3A4
SCHEMBL5709983 0.89 THRB (0.59) THRBLMNAALDH1A1USP2CYP3A4
SCHEMBL22395412 0.89 THRB (0.59) THRBLMNAALDH1A1USP2CYP3A4
SCHEMBL25389134 0.89 THRB (0.59) THRBLMNAALDH1A1USP2CYP3A4
SCHEMBL25303278 0.89 THRB (0.59) THRBLMNAALDH1A1USP2CYP3A4
SCHEMBL9278178 0.89 THRB (0.59) THRBLMNAALDH1A1USP2CYP3A4
SCHEMBL761878 0.87 THRB (0.77) THRBLMNAALDH1A1USP2CYP3A4
SCHEMBL9693830 0.87 THRB (0.58) THRBLMNAALDH1A1USP2CYP3A4
SCHEMBL721854 0.86

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4621488-A1 RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME Ycchem Co., Ltd. (KR) 2025-09-24 EP claimed
US-20250236813-A1 RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME YCCHEM CO., LTD. (KR) 2025-07-24 US claimed
CN-120019333-A Flushing liquid composition for extreme ultraviolet lithography and pattern forming method using same YC化学制品株式会社 2025-05-16 CN claimed
WO-2024106711-A1 RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME 와이씨켐 주식회사 2024-05-23 WO claimed
US-20230266672-A1 PROCESS SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME YOUNG CHANG CHEMICAL CO., LTD (KR) 2023-08-24 US claimed
EP-4212958-A1 PROCESS SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME Young Chang Chemical Co., Ltd. (KR) 2023-07-19 EP claimed
US-20220342313-A1 PROCESS LIQUID COMPOSITION FOR PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME YOUNG CHANG CHEMICAL CO., LTD (KR) 2022-10-27 US claimed
EP-4036648-A1 PROCESS LIQUID COMPOSITION FOR PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME Young Chang Chemical Co., Ltd. (KR) 2022-08-03 EP claimed
WO-2021060672-A1 PROCESS LIQUID COMPOSITION FOR PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME 영창케미칼 주식회사 2021-04-01 WO claimed
EP-4504883-B1 FABRIC TREATMENT COMPOSITIONS WITH ANTIOXIDANT MULTIMERS PROCTER & GAMBLE (US) 2026-04-29 EP disclosed
EP-4621488-A1 RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME Ycchem Co., Ltd. (KR) 2025-09-24 EP disclosed
US-20250236813-A1 RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD USING SAME YCCHEM CO., LTD. (KR) 2025-07-24 US disclosed
US-20250206939-A1 CURABLE SULFONATED POLYMER COMPOSITIONS NOTARK CORPORATION (US) 2025-06-26 US disclosed
EP-4558252-A1 PLANT AND METHOD FOR PRODUCING CARBON DIOXIDE Siemens Energy Global GmbH & Co. KG (DE) 2025-05-28 EP disclosed
US-20120055779-A1 Process for the purification of polyol PFPE derivatives SOLVAY SOLEXIS S.P.A. (IT) 2012-03-08 US disclosed
US-20110008277-A1 POLYOL-BASED POLYMERS MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2011-01-13 US disclosed
US-20100240930-A1 Process for the manufacture of polyol perfluoropolyether derivative SOLVAY SOLEXIS S.P.A. (IT) 2010-09-23 US disclosed
US-20100210745-A1 Molecular Healing of Polymeric Materials, Coatings, Plastics, Elastomers, Composites, Laminates, Adhesives, and Sealants by Active Enzymes REACTIVE SURFACES, LTD. (US) 2010-08-19 US disclosed
US-20100112460-A1 COMPOSITION FOR FLUORINE-CONTAINING VOLUME HOLOGRAPHIC DATA RECORDING MATERIAL AND FLUORINE-CONTAINING VOLUME HOLOGRAPHIC DATA RECORDING MEDIA MADE OF SAME UMEDA CENTER BUILDING (JP) 2010-05-06 US disclosed
WO-2008144514-A2 POLYOL-BASED POLYMERS MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2008-11-27 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110008277-A1 POLYOL-BASED POLYMERS SORD, SUCLG2, SUCLG1 THRB 4878/4885LMNA 2190/4885ALDH1A1 1149/4885
US-20100240930-A1 Process for the manufacture of polyol perfluoropolyether derivative AFF2, AFF1, AFF4 THRB 743/4885LMNA 2161/4885ALDH1A1 4235/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.