SCHEMBL10070920

SCHEMBL10070920

CC(C)C(=O)OC1CC2CCC1C1COC(=O)C21

nearest known ligand 0.34

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
PPARG P37231 2/20 0.31
LMNA P02545 1/20 0.31
CYP3A4 P08684 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10070921 0.89 LMNA (0.32) PPARGLMNACYP3A4
SCHEMBL6368203 0.88 CYP3A4 (0.35) LMNACYP3A4
SCHEMBL18845064 0.84
SCHEMBL75164 0.82 GPX4 (0.33) LMNACYP3A4
SCHEMBL19719134 0.82
SCHEMBL4688103 0.79
SCHEMBL6368210 0.78 CYP3A4 (0.34) CYP3A4
SCHEMBL824338 0.77 HMGCR (0.34) LMNACYP3A4
SCHEMBL15083641 0.77 L3MBTL1 (0.31)
SCHEMBL19335854 0.76 L3MBTL1 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8101341-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-01-24 US disclosed
US-8101341-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-01-24 US disclosed
US-20100178617-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-07-15 US disclosed
US-20100178617-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-07-15 US disclosed