SCHEMBL10079685

SCHEMBL10079685

OC(C1=C(C(O)(C(F)(F)F)C(F)(F)F)C2CCC1C2)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.31

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
NR1H2 P55055 1/20 0.31
NR1H3 Q13133 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14112047 0.91
SCHEMBL439936 0.88 HSD11B1 (0.33)
SCHEMBL10151912 0.68 NR1H2 (0.30) NR1H2NR1H3
SCHEMBL2899377 0.66
SCHEMBL5945290 0.65 CHRNB2 (0.32)
SCHEMBL15178555 0.63
SCHEMBL15096061 0.61 NR1H2 (0.33) NR1H2NR1H3
SCHEMBL8378246 0.56
SCHEMBL1614427 0.56
SCHEMBL10212969 0.54 MLYCD (0.31) NR1H2NR1H3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9678425-B2 Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation CENTRAL GLASS COMPANY, LIMITED (JP) 2017-06-13 US disclosed
US-20120082935-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM FORMED USING THE SAME JSR CORPORATION (JP) 2012-04-05 US disclosed
US-7402626-B2 Top coat composition CENTRAL GLASS COMPANY, LIMITED (JP) 2008-07-22 US disclosed