Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 1/20 | 0.33 |
| ▸ | NAAA | Q02083 | 2/20 | 0.32 |
| ▸ | FKBP1A | P62942 | 2/20 | 0.31 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10087711 | 0.98 | EPHX1 (0.36) | EPHX1NAAAFKBP1ACYP19A1 | |
| SCHEMBL10087713 | 0.98 | EPHX1 (0.36) | EPHX1NAAAFKBP1ACYP19A1 | |
| SCHEMBL824312 | 0.84 | EPHX1 (0.32) | EPHX1NAAA | |
| SCHEMBL47524 | 0.83 | HMGCR (0.40) | EPHX1NAAAFKBP1ACYP19A1 | |
| SCHEMBL824238 | 0.83 | EPHX1 (0.34) | EPHX1NAAACYP19A1 | |
| SCHEMBL824245 | 0.83 | EPHX1 (0.34) | EPHX1NAAACYP19A1 | |
| SCHEMBL47408 | 0.82 | HMGCR (0.40) | EPHX1NAAAFKBP1ACYP19A1 | |
| SCHEMBL47512 | 0.82 | HMGCR (0.40) | EPHX1NAAAFKBP1ACYP19A1 | |
| SCHEMBL2681186 | 0.80 | EPHX1 (0.44) | EPHX1NAAACYP19A1 | |
| SCHEMBL18898078 | 0.79 | EPHX1 (0.36) | EPHX1NAAAFKBP1ACYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8574813-B2 | Resist composition for immersion exposure and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-11-05 | — | — | US | disclosed |
| US-20120225383-A1 | RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-09-06 | — | — | US | disclosed |
| US-8192914-B2 | Resist composition for immersion exposure and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-06-05 | — | — | US | disclosed |
| US-7968269-B2 | Positive resist composition for immersion exposure and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-06-28 | — | — | US | disclosed |
| US-7964331-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-06-21 | — | — | US | disclosed |
| US-7939243-B2 | Resin, resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-05-10 | — | — | US | disclosed |
| US-7914968-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-03-29 | — | — | US | disclosed |
| US-7910285-B2 | Positive resist composition for immersion exposure and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-03-22 | — | — | US | disclosed |
| US-7871753-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-01-18 | — | — | US | disclosed |
| US-20100304289-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-12-02 | — | — | US | disclosed |
| US-7776511-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-08-17 | — | — | US | disclosed |
| US-20100196823-A1 | POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-08-05 | — | — | US | disclosed |
| US-20100159389-A1 | RESIN, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-06-24 | — | — | US | disclosed |
| US-20090253075-A1 | POSITIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-10-08 | — | — | US | disclosed |
| US-20090162786-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-06-25 | — | — | US | disclosed |
| US-20090155713-A1 | RESIST COMPOSITION AND PROCESS FOR PRODUCING SAME | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-06-18 | — | — | US | disclosed |
| US-20090053650-A1 | RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-02-26 | — | — | US | disclosed |
| US-7494762-B2 | Positive resist composition for immersion lithography and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-02-24 | — | — | US | disclosed |
| US-20090042130-A1 | POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO. LTD (JP) | 2009-02-12 | — | — | US | disclosed |
| US-20080090171-A1 | POSITIVE RESIST COMPOSITION FOR IMMERSION LITHOGRAPHY AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-04-17 | — | — | US | disclosed |