SCHEMBL10087737

SCHEMBL10087737

CCCCCCCCCCCCCCCCOc1c(F)c(F)c(C)c(F)c1F

nearest known ligand 0.40

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
NR5A1 Q13285 1/20 0.40
THRA P10827 4/20 0.39
THRB P10828 4/20 0.39
TLR4 O00206 2/20 0.36
PSEN1 P49768 3/20 0.36
TSHR P16473 2/20 0.36
PLA2G2A P14555 1/20 0.36
TP53 P04637 1/20 0.36
LPAR3 Q9UBY5 4/20 0.35
LPAR2 Q9HBW0 3/20 0.35
LPAR1 Q92633 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12452709 1.00 NR5A1 (0.40) NR5A1THRATHRBTLR4PSEN1
SCHEMBL12452693 1.00 NR5A1 (0.40) NR5A1THRATHRBTLR4PSEN1
SCHEMBL10141397 1.00 NR5A1 (0.40) NR5A1THRATHRBTLR4PSEN1
SCHEMBL12432991 1.00 NR5A1 (0.40) NR5A1THRATHRBTLR4PSEN1
SCHEMBL16687600 1.00 NR5A1 (0.40) NR5A1THRATHRBTLR4PSEN1
SCHEMBL28716497 0.90 NR5A1 (0.44) NR5A1THRATHRBTLR4TSHR
SCHEMBL9684001 0.90 NR5A1 (0.44) NR5A1THRATHRBTLR4TSHR
SCHEMBL9684782 0.90 NR5A1 (0.44) NR5A1THRATHRBTLR4TSHR
SCHEMBL9683848 0.90 NR5A1 (0.44) NR5A1THRATHRBTLR4TSHR
SCHEMBL9685171 0.90 NR5A1 (0.44) NR5A1THRATHRBTLR4TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170059992-A1 RESIST PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2017-03-02 US disclosed
US-8709704-B2 Pattern forming method using developer containing organic solvent and rinsing solution for use in the pattern forming method FUJIFILM CORPORATION (JP) 2014-04-29 US disclosed
US-8343708-B2 Positive resist composition and pattern forming method FUJIFILM CORPORATION (JP) 2013-01-01 US disclosed
US-20120034564-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2012-02-09 US disclosed
US-20110229832-A1 PATTERN FORMING METHOD USING DEVELOPER CONTAINING ORGANIC SOLVENT AND RINSING SOLUTION FOR USE IN THE PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2011-09-22 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110229832-A1 PATTERN FORMING METHOD USING DEVELOPER CONTAINING ORGANIC SOLVENT AND RINSING SOLUTION FOR USE IN THE PATTERN FORMING METHOD RER1, RARA, RARG NR5A1 2166/4885THRA 3445/4885THRB 3591/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.