Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NR5A1 | Q13285 | 1/20 | 0.40 |
| ▸ | THRA | P10827 | 4/20 | 0.39 |
| ▸ | THRB | P10828 | 4/20 | 0.39 |
| ▸ | TLR4 | O00206 | 2/20 | 0.36 |
| ▸ | PSEN1 | P49768 | 3/20 | 0.36 |
| ▸ | TSHR | P16473 | 2/20 | 0.36 |
| ▸ | PLA2G2A | P14555 | 1/20 | 0.36 |
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
| ▸ | LPAR3 | Q9UBY5 | 4/20 | 0.35 |
| ▸ | LPAR2 | Q9HBW0 | 3/20 | 0.35 |
| ▸ | LPAR1 | Q92633 | 2/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12452709 | 1.00 | NR5A1 (0.40) | NR5A1THRATHRBTLR4PSEN1 | |
| SCHEMBL12452693 | 1.00 | NR5A1 (0.40) | NR5A1THRATHRBTLR4PSEN1 | |
| SCHEMBL12432991 | 1.00 | NR5A1 (0.40) | NR5A1THRATHRBTLR4PSEN1 | |
| SCHEMBL16687600 | 1.00 | NR5A1 (0.40) | NR5A1THRATHRBTLR4PSEN1 | |
| SCHEMBL10087737 | 1.00 | NR5A1 (0.40) | NR5A1THRATHRBTLR4PSEN1 | |
| SCHEMBL28716497 | 0.90 | NR5A1 (0.44) | NR5A1THRATHRBTLR4TSHR | |
| SCHEMBL9684001 | 0.90 | NR5A1 (0.44) | NR5A1THRATHRBTLR4TSHR | |
| SCHEMBL9684782 | 0.90 | NR5A1 (0.44) | NR5A1THRATHRBTLR4TSHR | |
| SCHEMBL9683848 | 0.90 | NR5A1 (0.44) | NR5A1THRATHRBTLR4TSHR | |
| SCHEMBL9685171 | 0.90 | NR5A1 (0.44) | NR5A1THRATHRBTLR4TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9798235-B2 | Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same | FUJIFILM CORPORATION (JP) | 2017-10-24 | — | — | US | disclosed |
| US-20170255098-A1 | POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSURE AND A METHOD OF FORMING THE PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2017-09-07 | — | — | US | disclosed |
| US-9720319-B2 | Colored composition, cured film, color filter, method for manufacturing color filter, solid-state imaging element, image display device, and compound | FUJIFILM CORPORATION (JP) | 2017-08-01 | — | — | US | disclosed |
| US-9703196-B2 | Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same | FUJIFILM CORPORATION (JP) | 2017-07-11 | — | — | US | disclosed |
| US-9671687-B2 | Coloring composition, cured film, color filter, method for manufacturing color filter, solid-state imaging device, and image display device | FUJIFILM CORPORATION (JP) | 2017-06-06 | — | — | US | disclosed |
| US-20170146904-A1 | COLORING COMPOSITION, CURED FILM, COLOR FILTER, METHOD OF MANUFACTURING COLOR FILTER, SOLID IMAGE PICKUP ELEMENT, AND IMAGE DISPLAY APPARATUS | FUJIFILM CORPORATION (JP) | 2017-05-25 | — | — | US | disclosed |
| US-9605101-B2 | Pigment multimer, coloring composition, cured film, color filter, method for manufacturing color filter, solid-state imaging element, and image display device | FUJIFILM CORPORATION (JP) | 2017-03-28 | — | — | US | disclosed |
| US-9605154-B2 | Curable coloring composition, cured film, color filter, method for manufacturing color filter, solid-state image pickup element, picture display device, and triarylmethane compound | FUJIFILM CORPORATION (JP) | 2017-03-28 | — | — | US | disclosed |
| US-20170059992-A1 | RESIST PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2017-03-02 | — | — | US | disclosed |
| US-20170010530-A1 | COLORING COMPOSITION, CURED FILM, COLOR FILTER, METHOD FOR MANUFACTURING COLOR FILTER, SOLID-STATE IMAGING DEVICE, IMAGE DISPLAY DEVICE, ORGANIC ELECTROLUMINESCENT ELEMENT, COLORANT, AND METHOD FOR PRODUCING COLORANT | FUJIFILM CORPORATION (JP) | 2017-01-12 | — | — | US | disclosed |
| US-20130177850-A1 | POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSURE AND A METHOD OF FORMING THE PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2013-07-11 | — | — | US | disclosed |
| US-8426109-B2 | Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same | FUJIFILM CORPORATION (JP) | 2013-04-23 | — | — | US | disclosed |
| US-20120237874-A1 | Actinic-Ray- or Radiation-Sensitive Resin Composition, Compound and Method of Forming Pattern Using the Composition | FUJIFILM CORPORATION (JP) | 2012-09-20 | — | — | US | disclosed |
| US-20120015293-A1 | POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSURE AND A METHOD OF FORMING THE PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-01-19 | — | — | US | disclosed |
| US-20110229832-A1 | PATTERN FORMING METHOD USING DEVELOPER CONTAINING ORGANIC SOLVENT AND RINSING SOLUTION FOR USE IN THE PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2011-09-22 | — | — | US | disclosed |
| US-20110076622-A1 | POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN-FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-03-31 | — | — | US | disclosed |
| US-7892722-B2 | Pattern forming method | FUJIFILM CORPORATION (JP) | 2011-02-22 | — | — | US | disclosed |
| US-20110027716-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, COMPOUND AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-02-03 | — | — | US | disclosed |
| US-7695891-B2 | Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition | FUJIFILM CORPORATION (JP) | 2010-04-13 | — | — | US | disclosed |
| US-20070082289-A1 | Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-04-12 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110229832-A1 | PATTERN FORMING METHOD USING DEVELOPER CONTAINING ORGANIC SOLVENT AND RINSING SOLUTION FOR USE IN THE PATTERN FORMING METHOD | RER1, RARA, RARG | NR5A1 2166/4885THRA 3445/4885THRB 3591/4885 |
| US-20170255098-A1 | POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSURE AND A METHOD OF FORMING THE PATTERN USING THE SAME | POLR2H, POLQ, RXRA | NR5A1 3188/4885THRA 2632/4885THRB 3609/4885 |
| US-20120237874-A1 | Actinic-Ray- or Radiation-Sensitive Resin Composition, Compound and Method of Forming Pattern Using the Composition | RER1, RXRA, XRN2 | NR5A1 1925/4885THRA 2427/4885THRB 3912/4885 |
| US-20110027716-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, COMPOUND AND METHOD OF FORMING PATTERN USING THE COMPOSITION | RER1, RXRA, XRN2 | NR5A1 1925/4885THRA 2427/4885THRB 3912/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.