Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NR1I2 | O75469 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19012450 | 0.85 | NR1I2 (0.33) | NR1I2 | |
| SCHEMBL7894422 | 0.78 | NR1I2 (0.38) | NR1I2 | |
| SCHEMBL4757390 | 0.76 | ACHE (0.30) | — | |
| SCHEMBL1230990 | 0.75 | — | — | |
| SCHEMBL23671920 | 0.73 | CYP2D6 (0.30) | — | |
| SCHEMBL26845566 | 0.70 | — | — | |
| SCHEMBL4223261 | 0.69 | — | — | |
| SCHEMBL10344281 | 0.69 | ALDH1A1 (0.37) | NR1I2 | |
| SCHEMBL10579900 | 0.69 | ALDH1A1 (0.37) | NR1I2 | |
| Adamantane SCHEMBL28522193 | 0.67 | ALDH1A1 (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9170488-B2 | Resist pattern-forming method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2015-10-27 | — | — | US | disclosed |
| US-20150093692-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM USED THEREFOR, AND ELECTRONIC DEVICE MANUFACTURING METHOD AND ELECTRONIC DEVICE USING THE SAMEDEVICE MANUFACTURING METHOD AND ELECTRONIC DEVICE USING THE SAME | FUJIFILM CORPORATION (JP) | 2015-04-02 | — | — | US | disclosed |
| US-20150093704-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST-PATTERNING METHOD, AND BLOCK COPOLYMER | JSR CORPORATION (JP) | 2015-04-02 | — | — | US | disclosed |
| US-8980539-B2 | Developer | JSR CORPORATION (JP) | 2015-03-17 | — | — | US | disclosed |
| US-8968980-B2 | Radiation-sensitive resin composition and compound | JSR CORPORATION (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8927200-B2 | Double patterning method | JSR CORPORATION (JP) | 2015-01-06 | — | — | US | disclosed |
| US-20140295350-A1 | RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORP (JP) | 2014-10-02 | — | — | US | disclosed |
| US-8815493-B2 | Resist pattern-forming method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2014-08-26 | — | — | US | disclosed |
| US-8795954-B2 | Resist pattern-forming method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2014-08-05 | — | — | US | disclosed |
| US-20140178825-A1 | DEVELOPER | JSR CORPORATION (JP) | 2014-06-26 | — | — | US | disclosed |
| US-8703401-B2 | Method for forming pattern and developer | JSR CORPORATION (JP) | 2014-04-22 | — | — | US | disclosed |
| US-20140080066-A1 | DOUBLE PATTERNING METHOD | JSR CORPORATION (JP) | 2014-03-20 | — | — | US | disclosed |
| US-20130230803-A1 | RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2013-09-05 | — | — | US | disclosed |
| US-20130224666-A1 | RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2013-08-29 | — | — | US | disclosed |
| US-20120308938-A1 | METHOD FOR FORMING PATTERN AND DEVELOPER | JSR CORPORATION (JP) | 2012-12-06 | — | — | US | disclosed |
| US-20120045719-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND | JSR CORPORATION (JP) | 2012-02-23 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120045719-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND | RFT1, RER1, ZYX | NR1I2 660/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.