⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10002102 | 0.83 | TSHR (0.35) | — | |
| SCHEMBL14133213 | 0.80 | — | — | |
| SCHEMBL29433272 | 0.77 | TSHR (0.35) | — | |
| SCHEMBL64334 | 0.77 | — | — | |
| SCHEMBL17407784 | 0.77 | — | — | |
| SCHEMBL19326832 | 0.76 | ALDH1A1 (0.31) | — | |
| Ammonia Solution, Strong SCHEMBL2512351 | 0.75 | ALDH1A1 (0.33) | — | |
| Hydrochloric Acid SCHEMBL10696594 | 0.75 | ALDH1A1 (0.33) | — | |
| SCHEMBL2754981 | 0.74 | CES1 (0.31) | — | |
| SCHEMBL5500329 | 0.74 | LMNA (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9594303-B2 | Resist pattern-forming method and photoresist composition | JSR CORPORATION (JP) | 2017-03-14 | — | — | US | disclosed |
| US-20150010866-A1 | RESIST PATTERN-FORMING METHOD AND PHOTORESIST COMPOSITION | JSR CORPORATION (JP) | 2015-01-08 | — | — | US | disclosed |
| US-8580480-B2 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and compound | JSR CORPORATION (JP) | 2013-11-12 | — | — | US | disclosed |
| US-20120028189-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND COMPOUND | JSR CORPORATION (JP) | 2012-02-02 | — | — | US | disclosed |