SCHEMBL10103423

SCHEMBL10103423

CCCC(=O)OCOC1CCCCC1

nearest known ligand 0.49

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 2/20 0.49
EPHX1 P07099 1/20 0.41
ALDH1A1 P00352 5/20 0.40
LMNA P02545 1/20 0.40
EPHX2 P34913 1/20 0.38
HTT P42858 2/20 0.37
CYP2C19 P33261 1/20 0.35
NLRP3 Q96P20 1/20 0.35
DGKA P23743 1/20 0.33
MEN1 O00255 1/20 0.33
MAPT P10636 1/20 0.33
KMT2A Q03164 1/20 0.33
ATM Q13315 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14878943 0.85 NAAA (0.43) NAAAEPHX1ALDH1A1LMNAHTT
SCHEMBL9518602 0.85 NAAA (0.51) NAAAEPHX1ALDH1A1LMNAEPHX2
SCHEMBL14136040 0.85 NAAA (0.43) NAAAEPHX1ALDH1A1LMNAHTT
SCHEMBL10033955 0.79 NAAA (0.73) NAAAEPHX1ALDH1A1LMNAHTT
SCHEMBL397795 0.79 NAAA (0.73) NAAAEPHX1ALDH1A1LMNAHTT
SCHEMBL24603593 0.79 EPHX1 (0.40) NAAAEPHX1ALDH1A1LMNAHTT
SCHEMBL1695502 0.79 NAAA (0.73) NAAAEPHX1ALDH1A1LMNAHTT
SCHEMBL2739883 0.79 EPHX1 (0.40) NAAAEPHX1ALDH1A1LMNAHTT
SCHEMBL9134369 0.79 NAAA (0.73) NAAAEPHX1ALDH1A1LMNAHTT
SCHEMBL10033782 0.79 NAAA (0.73) NAAAEPHX1ALDH1A1LMNAHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8105747-B2 Positive resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2012-01-31 US disclosed
US-20100075249-A1 POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2010-03-25 US disclosed