⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL870599 | 0.97 | — | — | |
| SCHEMBL5759115 | 0.97 | — | — | |
| Methane SCHEMBL1011418 | 0.94 | — | — | |
| SCHEMBL4679687 | 0.86 | — | — | |
| Ethane SCHEMBL1011517 | 0.78 | EPHX1 (0.35) | — | |
| SCHEMBL17040297 | 0.76 | — | — | |
| SCHEMBL17040301 | 0.76 | — | — | |
| SCHEMBL11556803 | 0.76 | — | — | |
| SCHEMBL5866508 | 0.74 | — | — | |
| Ethane SCHEMBL1650765 | 0.74 | OPRM1 (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 350 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260092132-A1 | WATER-ABSORBENT RESIN COMPOSITION, WATER-BLOCKING MATERIAL, AND CABLE | SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) | 2026-04-02 | — | — | US | disclosed |
| EP-3312218-B1 | POLY (METH) ACRYLIC ACID (SALT) GRANULAR WATER ABSORBENT AND METHOD FOR PRODUCING SAME | NIPPON CATALYTIC CHEM IND (JP) | 2026-04-01 | — | — | EP | disclosed |
| EP-4700069-A1 | PRODUCTION METHOD FOR WATER-ABSORBING RESIN PARTICLES, ABSORBER, AND ABSORBENT ARTICLE | Sumitomo Seika Chemicals Co., Ltd. (JP) | 2026-02-25 | — | — | EP | disclosed |
| US-12533658-B2 | Water-absorbent resin particles | SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) | 2026-01-27 | — | — | US | disclosed |
| US-12515191-B2 | Particulate water-absorbent resin composition | SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) | 2026-01-06 | — | — | US | disclosed |
| EP-4667517-A1 | WATER-ABSORBENT RESIN PARTICLES AND PRODUCTION METHOD THEREFOR, ABSORBENT BODY, AND ABSORBENT ARTICLE | Sumitomo Seika Chemicals Co., Ltd. (JP) | 2025-12-24 | — | — | EP | disclosed |
| EP-4644489-A1 | WATER-ABSORBING RESIN COMPOSITION, WATER-STOPPING MATERIAL, AND CABLE | Sumitomo Seika Chemicals Co., Ltd. (JP) | 2025-11-05 | — | — | EP | disclosed |
| US-12427503-B2 | Method for producing water absorbent resin particles and aqueous monomer solution | SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) | 2025-09-30 | — | — | US | disclosed |
| EP-4592362-A1 | WATER-ABSORBING RESIN COMPOSITION, WATER-STOPPING MATERIAL, AND CABLE | Sumitomo Seika Chemicals Co., Ltd. (JP) | 2025-07-30 | — | — | EP | disclosed |
| EP-4592361-A1 | WATER-ABSORBENT RESIN COMPOSITION, WATER STOP MATERIAL, AND CABLE | Sumitomo Seika Chemicals Co., Ltd. (JP) | 2025-07-30 | — | — | EP | disclosed |
| EP-1757635-A1 | Curable modified oxetane compound and ink composition comprising it | Fuji Photo Film Co., Ltd. (JP) | 2007-02-28 | — | — | EP | disclosed |
| WO-2007001407-A2 | LIGHT ACTIVATED SHAPE MEMORY CO-POLYMERS | CORNERSTONE RESEARCH GROUP, INC. (US) | 2007-01-04 | — | — | WO | disclosed |
| US-20060194055-A1 | Process for production of water-absorbing resin particles | SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) | 2006-08-31 | — | — | US | disclosed |
| EP-1609810-A1 | PROCESS FOR PRODUCTION OF WATER-ABSORBING RESIN PARTICLES | SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) | 2005-12-28 | — | — | EP | disclosed |
| US-6809158-B2 | AN OXETANE COMPOUND AND/OR AN IMIDAZOLIDINONE FOR CROSSLINKING A WATER-ABSORBENT RESIN; BALANCE BETWEEN THE ABSORPTION CAPACITY WITHOUT AND WITH A LOAD; FLUIDITY UNDER A HYGROSCOPIC ATMOSPHERE; EXCELLENT SAFETY; DISPOSABLE PRODUCTS | NIPPON SHOKUBAI CO., LTD. (JP) | 2004-10-26 | — | — | US | disclosed |
| US-6495636-B2 | A 3-(ETHYLENEOXYALKYLOXYALKYL)OXETANE AND DERIVATIVES; COPOLYMERIZED WITH A 1,1-DIFLUOROETHYLENE OR DERIVATIVE; VERY COMPATIBLE AND COPOLYMERIZABLE WITH UNSATURATED COMPOUNDS; WATERPROOFING; RADIATION TRANSPARENT | JSR CORPORATION (JP) | 2002-12-17 | — | — | US | disclosed |
| US-20020072471-A1 | Water-absorbing agent and process for producing the same | NIPPON SHOKUBAI CO., LTD. (JP) | 2002-06-13 | — | — | US | disclosed |
| EP-1199327-A2 | Water-absorbing agent and process for producing the same | Nippon Shokubai Co., Ltd. (JP) | 2002-04-24 | — | — | EP | disclosed |
| US-20010002423-A1 | Oxetane compound, oxetane copolymer, and process for producing the oxetane compound | SUGIYAMA NAOKI (JP) | 2001-05-31 | — | — | US | disclosed |
| EP-1095938-A1 | OXETANE COMPOUNDS, OXETANE COPOLYMER, AND PROCESS FOR PRODUCING OXETANE COMPOUNDS | JSR Corporation (JP) | 2001-05-02 | — | — | EP | disclosed |