Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PDK1 | Q15118 | 1/20 | 0.33 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.33 |
| ▸ | PDK3 | Q15120 | 1/20 | 0.33 |
| ▸ | PDK4 | Q16654 | 1/20 | 0.33 |
| ▸ | CHRM2 | P08172 | 3/20 | 0.32 |
| ▸ | CHRM4 | P08173 | 3/20 | 0.32 |
| ▸ | CHRM1 | P11229 | 3/20 | 0.32 |
| ▸ | CHRM3 | P20309 | 3/20 | 0.32 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | RECQL | P46063 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10243718 | 0.86 | PDK1 (0.34) | PDK1PDK2PDK3PDK4CHRM2 | |
| SCHEMBL10115704 | 0.86 | PDK1 (0.34) | PDK1PDK2PDK3PDK4CHRM2 | |
| SCHEMBL10115796 | 0.86 | PDK1 (0.34) | PDK1PDK2PDK3PDK4CHRM2 | |
| SCHEMBL13385934 | 0.85 | PDK1 (0.33) | PDK1PDK2PDK3PDK4CHRM2 | |
| SCHEMBL18802888 | 0.85 | PDK1 (0.33) | PDK1PDK2PDK3PDK4CHRM2 | |
| SCHEMBL18198996 | 0.84 | FKBP1A (0.34) | PDK1PDK2PDK3PDK4CHRM2 | |
| SCHEMBL13127639 | 0.76 | EPHX1 (0.45) | PDK1PDK2PDK3PDK4CHRM2 | |
| SCHEMBL110743 | 0.76 | EPHX1 (0.45) | PDK1PDK2PDK3PDK4CHRM2 | |
| SCHEMBL15113913 | 0.75 | PDK1 (0.33) | PDK1PDK2PDK3PDK4 | |
| SCHEMBL15116364 | 0.75 | FKBP1A (0.35) | PDK1PDK2PDK3PDK4CHRM2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9541831-B2 | Positive resist composition and method of pattern formation with the same | FUJIFILM CORPORATION (JP) | 2017-01-10 | — | — | US | disclosed |
| US-20150185609-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF PATTERN FORMATION WITH THE SAME | FUJIFILM CORPORATION (JP) | 2015-07-02 | — | — | US | disclosed |
| US-9057952-B2 | Positive resist composition and method of pattern formation with the same | FUJIFILM CORPORATION (JP) | 2015-06-16 | — | — | US | disclosed |
| US-8871421-B2 | Positive resist composition and method of pattern formation with the same | FUJIFILM CORPORATION (JP) | 2014-10-28 | — | — | US | disclosed |
| US-20120115085-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF PATTERN FORMATION WITH THE SAME | FUJIFILM CORPORATION (JP) | 2012-05-10 | — | — | US | disclosed |