Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PDK1 | Q15118 | 1/20 | 0.34 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.34 |
| ▸ | PDK3 | Q15120 | 1/20 | 0.34 |
| ▸ | PDK4 | Q16654 | 1/20 | 0.34 |
| ▸ | CHRM2 | P08172 | 4/20 | 0.32 |
| ▸ | CHRM4 | P08173 | 4/20 | 0.32 |
| ▸ | CHRM1 | P11229 | 4/20 | 0.32 |
| ▸ | CHRM3 | P20309 | 4/20 | 0.32 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | LIPA | P38571 | 1/20 | 0.30 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.30 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13918181 | 0.88 | LIPA (0.43) | HSD11B1MAPTLIPAEPHX1 | |
| SCHEMBL18802888 | 0.86 | PDK1 (0.33) | PDK1PDK2PDK3PDK4CHRM2 | |
| SCHEMBL10115724 | 0.86 | PDK1 (0.33) | PDK1PDK2PDK3PDK4CHRM2 | |
| SCHEMBL12009267 | 0.86 | LIPA (0.33) | LIPA | |
| SCHEMBL14598127 | 0.86 | LIPA (0.33) | LIPA | |
| SCHEMBL13385934 | 0.86 | PDK1 (0.33) | PDK1PDK2PDK3PDK4CHRM2 | |
| SCHEMBL15858412 | 0.83 | CHRM2 (0.35) | PDK1PDK2PDK3PDK4CHRM2 | |
| SCHEMBL18802879 | 0.80 | FKBP1A (0.36) | CHRM2CHRM4CHRM1CHRM3EPHX1 | |
| SCHEMBL18802861 | 0.80 | FKBP1A (0.36) | CHRM2CHRM4CHRM1CHRM3EPHX1 | |
| SCHEMBL106966 | 0.80 | FKBP1A (0.36) | CHRM2CHRM4CHRM1CHRM3EPHX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8846290-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2014-09-30 | — | — | US | disclosed |
| US-20120015302-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-01-19 | — | — | US | disclosed |
| US-20070178405-A1 | Positive resist composition and method of pattern formation with the same | FUJI PHOTO FILM CO., LTD. | 2007-08-02 | — | — | US | disclosed |