SCHEMBL10127162

SCHEMBL10127162

CCC(C)c1ccc(OC(O)OC(C)(C)C)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.46
TSHR P16473 2/20 0.46
GAA P10253 2/20 0.42
MAPT P10636 1/20 0.42
SLC7A5 Q01650 1/20 0.42
NPC1 O15118 2/20 0.41
RAB9A P51151 2/20 0.41
MEN1 O00255 1/20 0.40
KMT2A Q03164 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
HSP90AA1 P07900 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
CYP2C9 P11712 1/20 0.36
USP2 O75604 1/20 0.36
PKM P14618 1/20 0.36
HPGD P15428 1/20 0.36
ALOX15 P16050 1/20 0.36
HSD17B10 Q99714 1/20 0.36
LTB4R Q15722 1/20 0.35
LTB4R2 Q9NPC1 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13918192 0.83 ALDH1A1 (0.45) ALDH1A1TSHRGAAMAPTSLC7A5
SCHEMBL13222523 0.80 ALDH1A1 (0.49) ALDH1A1TSHRGAAMAPTSLC7A5
SCHEMBL10203858 0.79 ALDH1A1 (0.54) ALDH1A1TSHRGAAMAPTSLC7A5
SCHEMBL17679434 0.79 ALDH1A1 (0.54) ALDH1A1TSHRGAAMAPTSLC7A5
SCHEMBL17679431 0.78 ALDH1A1 (0.51) ALDH1A1TSHRGAAMAPTNPC1
SCHEMBL14492742 0.77 ALDH1A1 (0.46) ALDH1A1TSHRGAAMAPTSLC7A5
SCHEMBL2109347 0.76 ALDH1A1 (0.51) ALDH1A1TSHRGAAMAPTSLC7A5
SCHEMBL12812191 0.75 ACHE (0.38) ALDH1A1TSHRMAPTMEN1KMT2A
SCHEMBL93073 0.75 ALDH1A1 (0.50) ALDH1A1TSHRGAAMAPTSLC7A5
SCHEMBL12438456 0.75 ALDH1A1 (0.53) ALDH1A1TSHRGAAMAPTSLC7A5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9465298-B2 Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method FUJIFILM CORPORATION (JP) 2016-10-11 US disclosed
US-20160103395-A1 PATTERN FORMING METHOD, RESIST COMPOSITION FOR MULTIPLE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, DEVELOPER FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, AND RINSING SOLUTION FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2016-04-14 US disclosed
US-8206886-B2 Photosensitive composition and pattern-forming method using the photosensitive composition FUJIFILM CORPORATION (JP) 2012-06-26 US disclosed