Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE | P22303 | 2/20 | 0.38 |
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | WDR5 | P61964 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 3/20 | 0.34 |
| ▸ | PPARG | P37231 | 2/20 | 0.34 |
| ▸ | PPARA | Q07869 | 2/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | MAPT | P10636 | 2/20 | 0.34 |
| ▸ | USP2 | O75604 | 1/20 | 0.34 |
| ▸ | NLRP1 | Q9C000 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | TEAD4 | Q15561 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21133303 | 0.82 | LMNA (0.39) | LMNAKMT2AMEN1TSHRALDH1A1 | |
| SCHEMBL23597908 | 0.78 | AR (0.41) | LMNATSHRALDH1A1MAPTCYP3A4 | |
| SCHEMBL10127162 | 0.75 | ALDH1A1 (0.46) | KMT2AMEN1TSHRALDH1A1MAPT | |
| SCHEMBL18287891 | 0.72 | SLC6A2 (0.39) | KMT2AMEN1PPARGPPARAMAPT | |
| SCHEMBL7521294 | 0.72 | ACHE (0.46) | ACHELMNAKMT2AMEN1TSHR | |
| SCHEMBL20432958 | 0.71 | LMNA (0.39) | ACHELMNAWDR5KMT2AMEN1 | |
| SCHEMBL18287880 | 0.68 | MAPT (0.47) | LMNATSHRALDH1A1MAPT | |
| SCHEMBL15930094 | 0.68 | ACHE (0.42) | ACHELMNAKMT2AMEN1TSHR | |
| SCHEMBL8723823 | 0.68 | ACHE (0.42) | ACHELMNAKMT2AMEN1TSHR | |
| SCHEMBL17904768 | 0.68 | ACHE (0.42) | ACHELMNAKMT2AMEN1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2011034213-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING A PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-03-24 | — | — | WO | disclosed |