Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 5/20 | 0.39 |
| ▸ | MEN1 | O00255 | 2/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.37 |
| ▸ | MITF | O75030 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.36 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | BCHE | P06276 | 1/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.35 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | PPARG | P37231 | 2/20 | 0.32 |
| ▸ | PPARA | Q07869 | 2/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26156496 | 0.90 | POLB (0.39) | SMN1; SMN2HPGDRAB9ABCHEALDH1A1 | |
| SCHEMBL17147976 | 0.88 | ELANE (0.38) | ELANEMEN1KMT2ARAB9A | |
| SCHEMBL12021615 | 0.83 | ELANE (0.38) | ELANEMEN1KMT2ANPC1RAB9A | |
| SCHEMBL9963742 | 0.82 | ELANE (0.37) | ELANEMEN1KMT2AMITFSMN1; SMN2 | |
| SCHEMBL14028973 | 0.82 | NPC1 (0.46) | KMT2ASMN1; SMN2NPC1RAB9AALDH1A1 | |
| SCHEMBL9880580 | 0.80 | ELANE (0.48) | ELANEMEN1KMT2AALDH1A1 | |
| SCHEMBL10183956 | 0.80 | SMN1; SMN2 (0.38) | ELANEMEN1KMT2AMITFSMN1; SMN2 | |
| SCHEMBL13059578 | 0.78 | HRH3 (0.43) | NPC1RAB9A | |
| SCHEMBL7271950 | 0.78 | PPARG (0.32) | ELANEMEN1KMT2ASMN1; SMN2KDM4E | |
| SCHEMBL6123988 | 0.78 | ELANE (0.46) | ELANEMEN1KMT2APPARA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9217919-B2 | Photosensitive composition, pattern-forming method using the composition, and resin used in the composition | FUJIFILM CORPORATION (JP) | 2015-12-22 | — | — | US | disclosed |
| US-8906253-B2 | Gap embedding composition, method of embedding gap and method of producing semiconductor device by using the composition | FUJIFILM CORPORATION (JP) | 2014-12-09 | — | — | US | disclosed |
| US-20140322914-A1 | GAP EMBEDDING COMPOSITION, METHOD OF EMBEDDING GAP AND METHOD OF PRODUCING SEMICONDUCTOR DEVICE BY USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2014-10-30 | — | — | US | disclosed |
| US-8642245-B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming a pattern using the same | FUJIFILM CORPORATION (JP) | 2014-02-04 | — | — | US | disclosed |
| US-20130273741-A1 | GAP EMBEDDING COMPOSITION, METHOD OF EMBEDDING GAP AND METHOD OF PRODUCING SEMICONDUCTOR DEVICE BY USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2013-10-17 | — | — | US | disclosed |
| US-8507174-B2 | Positive resist composition, pattern forming method using the composition, and compound for use in the composition | FUJIFILM CORPORATION (JP) | 2013-08-13 | — | — | US | disclosed |
| US-20120231393-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING A PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-09-13 | — | — | US | disclosed |
| US-8092978-B2 | Positive resist composition for electron beam, X-ray or EUV and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2012-01-10 | — | — | US | disclosed |
| US-8017299-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2011-09-13 | — | — | US | disclosed |
| US-20110183258-A1 | POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION, AND COMPOUND FOR USE IN THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-07-28 | — | — | US | disclosed |
| US-20110159433-A1 | PHOTOSENSITIVE COMPOSITION, PATTERN-FORMING METHOD USING THE COMPOSITION, AND RESIN USED IN THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-06-30 | — | — | US | disclosed |
| US-7858289-B2 | Positive resist composition for electron beam, X-ray or EUV and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2010-12-28 | — | — | US | disclosed |
| US-20090246685-A1 | POSITIVE RESIST COMPOSITION FOR ELECTRON BEAM, X-RAY OR EUV AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-10-01 | — | — | US | disclosed |
| US-20090202946-A1 | POSITIVE RESIST COMPOSITION FOR USE WITH ELECTRON BEAM, X-RAY OR EUV AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-08-13 | — | — | US | disclosed |
| US-20090111047-A1 | POSITIVE RESIST COMPOSITION FOR ELECTRON BEAM, X-RAY OR EUV AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-30 | — | — | US | disclosed |
| US-20090111053-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-30 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110159433-A1 | PHOTOSENSITIVE COMPOSITION, PATTERN-FORMING METHOD USING THE COMPOSITION, AND RESIN USED IN THE COMPOSITION | SUN2, LCP1, PHYKPL | ELANE 1810/4885MEN1 2467/4885KMT2A 2523/4885 |
| US-20110183258-A1 | POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION, AND COMPOUND FOR USE IN THE COMPOSITION | CROCC, ACTR2, MRE11 | ELANE 772/4885MEN1 4100/4885KMT2A 2809/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.