SCHEMBL10144329

SCHEMBL10144329

COC(=O)Sc1ccccc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.46
KMT2A Q03164 3/20 0.42
KCNN4 O15554 1/20 0.42
SMN1; SMN2 Q16637 4/20 0.42
MAPT P10636 2/20 0.42
HSD17B10 Q99714 2/20 0.42
HPGD P15428 2/20 0.42
TP53 P04637 2/20 0.42
MEN1 O00255 2/20 0.42
MGLL Q99685 1/20 0.42
POLB P06746 1/20 0.42
MAPK1 P28482 1/20 0.42
ALDH1A1 P00352 1/20 0.41
FFAR1 O14842 1/20 0.40
MTNR1A P48039 1/20 0.40
MTNR1B P49286 1/20 0.40
EPHX1 P07099 1/20 0.39
EPHX2 P34913 1/20 0.39
CDK9 P50750 1/20 0.39
CLK4 Q9HAZ1 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride SCHEMBL27784131 0.98 TSHR (0.45) TSHRKMT2AKCNN4SMN1; SMN2MAPT
SCHEMBL6683261 0.81 HPGD (0.46) TSHRKMT2ASMN1; SMN2MAPTHSD17B10
SCHEMBL17335274 0.80 TSHR (0.45) TSHRKMT2AKCNN4SMN1; SMN2HPGD
SCHEMBL24341137 0.78 MAPT (0.43) TSHRKMT2ASMN1; SMN2MAPTHSD17B10
SCHEMBL11615005 0.78 HSD17B10 (0.50) TSHRKMT2AKCNN4SMN1; SMN2MAPT
SCHEMBL6832557 0.77 HPGD (0.42) TSHRKMT2ASMN1; SMN2MAPTHSD17B10
SCHEMBL12319725 0.77 HPGD (0.42) TSHRKMT2ASMN1; SMN2MAPTHSD17B10
SCHEMBL6968617 0.77 HPGD (0.42) TSHRKMT2ASMN1; SMN2MAPTHSD17B10
SCHEMBL6962294 0.77 FFAR1 (0.41) TSHRKMT2ASMN1; SMN2MAPTHSD17B10
SCHEMBL15282308 0.77 ALDH1A1 (0.50) TSHRKMT2ASMN1; SMN2MAPTHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111704567-A Method for preparing trithiocarbonic acid methyl phenyl ester compound with hypoglycemic effect 诸暨市人民医院 2020-09-25 CN claimed
US-3998805-A MONOAZO DYES; POLYESTERS; YELLOW, RED, OR ORANGE SHADES CIBA-GEIGY CORPORATION (US) 1976-12-21 US claimed
WO-2021041583-A1 COMPOUNDS TO IDENTIFY BETA-LACTAMASES, AND METHODS OF USE THEREOF THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 2021-03-04 WO disclosed
CN-103446724-B Golf 邓禄普体育用品株式会社 2018-01-19 CN disclosed
US-8828629-B2 Black curable composition, light-shielding color filter for a solid-state imaging device and method of producing the same, solid-state imaging device, wafer level lens, and camera module FUJIFILM CORPORATION (JP) 2014-09-09 US disclosed
US-8828629-B2 Black curable composition, light-shielding color filter for a solid-state imaging device and method of producing the same, solid-state imaging device, wafer level lens, and camera module FUJIFILM CORPORATION (JP) 2014-09-09 US disclosed
EP-2421825-B1 AZETIDINYL DIAMIDES AS MONOACYLGLYCEROL LIPASE INHIBITORS JANSSEN PHARMACEUTICA NV (BE) 2014-01-01 EP disclosed
US-20130028587-A1 BLACK CURABLE COMPOSITION, LIGHT-SHIELDING COLOR FILTER FOR A SOLID-STATE IMAGING DEVICE AND METHOD OF PRODUCING THE SAME, SOLID-STATE IMAGING DEVICE, WAFER LEVEL LENS, AND CAMERA MODULE FUJIFILM CORPORATION (JP) 2013-01-31 US disclosed
US-20130028587-A1 BLACK CURABLE COMPOSITION, LIGHT-SHIELDING COLOR FILTER FOR A SOLID-STATE IMAGING DEVICE AND METHOD OF PRODUCING THE SAME, SOLID-STATE IMAGING DEVICE, WAFER LEVEL LENS, AND CAMERA MODULE FUJIFILM CORPORATION (JP) 2013-01-31 US disclosed
US-8119311-B2 Photosensitive resin composition, light-shielding color filter and production process therefor, and image sensor FUJIFILM CORPORATION (JP) 2012-02-21 US disclosed
US-8119311-B2 Photosensitive resin composition, light-shielding color filter and production process therefor, and image sensor FUJIFILM CORPORATION (JP) 2012-02-21 US disclosed
US-8110324-B2 Photosensitive resin composition, light-shielding color filter and production process therefor, and image sensor FUJIFILM CORPORATION (JP) 2012-02-07 US disclosed
US-8110324-B2 Photosensitive resin composition, light-shielding color filter and production process therefor, and image sensor FUJIFILM CORPORATION (JP) 2012-02-07 US disclosed
US-20090246651-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIGHT-SHIELDING COLOR FILTER AND PRODUCTION PROCESS THEREFOR, AND IMAGE SENSOR FUJIFILM CORPORATION (JP) 2009-10-01 US disclosed
US-20090246651-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIGHT-SHIELDING COLOR FILTER AND PRODUCTION PROCESS THEREFOR, AND IMAGE SENSOR FUJIFILM CORPORATION (JP) 2009-10-01 US disclosed
US-20090246650-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIGHT-SHIELDING COLOR FILTER AND PRODUCTION PROCESS THEREFOR, AND IMAGE SENSOR FUJIFILM CORPORATION (JP) 2009-10-01 US disclosed
US-20090246650-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIGHT-SHIELDING COLOR FILTER AND PRODUCTION PROCESS THEREFOR, AND IMAGE SENSOR FUJIFILM CORPORATION (JP) 2009-10-01 US disclosed
EP-2105792-A1 Photosensitive resin composition, light-shielding color filter and production process therefor, and image sensor FUJIFILM Corporation (JP) 2009-09-30 EP disclosed