Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12996988 | 0.83 | SMN1; SMN2 (0.41) | RIPK1 | |
| SCHEMBL5309982 | 0.79 | HMGCR (0.39) | LIPA | |
| SCHEMBL13141909 | 0.76 | RIPK1 (0.31) | RIPK1 | |
| SCHEMBL9959957 | 0.75 | KDM4E (0.36) | — | |
| SCHEMBL107703 | 0.71 | HMGCR (0.33) | — | |
| SCHEMBL18802856 | 0.70 | HMGCR (0.32) | — | |
| SCHEMBL19059482 | 0.70 | TDP1 (0.39) | LIPA | |
| SCHEMBL15203371 | 0.69 | — | — | |
| SCHEMBL15360815 | 0.69 | CES2 (0.31) | — | |
| SCHEMBL3516359 | 0.69 | HMGCR (0.46) | LIPA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8507172-B2 | Positive resist composition and pattern forming method using the positive resist composition | FUJIFILM CORPORATION (JP) | 2013-08-13 | — | — | US | disclosed |
| US-20120077131-A1 | METHOD OF FORMING PATTERN USING ACTINIC-RAY OR RADIATION-SENSITIVE RESIN COMPOSITION, AND PATTERN | FUJIFILM CORPORATION (JP) | 2012-03-29 | — | — | US | disclosed |
| US-20100040975-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE POSITIVE RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-02-18 | — | — | US | disclosed |