SCHEMBL10160130

SCHEMBL10160130

O=C(C[S+](CC(=O)c1ccccc1)c1ccccc1)c1ccccc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 4/20 0.54
KMT2A Q03164 3/20 0.54
MAPK1 P28482 2/20 0.54
MAPT P10636 2/20 0.54
MEN1 O00255 2/20 0.54
CYP3A4 P08684 2/20 0.54
HPGD P15428 2/20 0.54
CES1 P23141 2/20 0.54
KDM4E B2RXH2 1/20 0.54
ALOX15 P16050 1/20 0.54
SMN1; SMN2 Q16637 1/20 0.54
ALDH1A1 P00352 5/20 0.50
GSK3B P49841 2/20 0.50
PTPN1 P18031 2/20 0.50
HIF1A Q16665 2/20 0.50
TRPA1 O75762 1/20 0.50
L3MBTL1 Q9Y468 3/20 0.48
LMNA P02545 1/20 0.48
NR4A2 P43354 1/20 0.48
ERCC5 P28715 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1095578 0.83 TDP1 (0.54) TDP1KMT2AMAPK1MAPTMEN1
SCHEMBL2740822 0.82 CES1 (0.44) TDP1KMT2AMAPK1MAPTMEN1
SCHEMBL562504 0.79 MAPK1 (0.61) TDP1KMT2AMAPK1MAPTMEN1
SCHEMBL1128350 0.79 TDP1 (0.50) TDP1KMT2AMAPK1MAPTMEN1
SCHEMBL4110305 0.79 KMT2A (0.50) TDP1KMT2AMAPK1MAPTMEN1
SCHEMBL8855000 0.76 MAPT (0.47) TDP1KMT2AMAPK1MAPTMEN1
Perchlorate SCHEMBL9003671 0.76 TDP1 (0.47) TDP1KMT2AMAPK1MAPTMEN1
SCHEMBL686321 0.76 KMT2A (0.56) TDP1KMT2AMAPK1MAPTMEN1
SCHEMBL565176 0.76 MAPT (0.56) TDP1KMT2AMAPK1MAPTMEN1
Bromide SCHEMBL394250 0.74 KMT2A (0.54) TDP1KMT2AMAPK1MAPTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230280651-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-07 US disclosed
US-20230280651-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-07 US disclosed
US-11693314-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-04 US disclosed
US-11693314-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-04 US disclosed
US-20210200083-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-07-01 US disclosed
US-8105760-B2 Patterning process and pattern surface coating composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-01-31 US disclosed
US-20090053657-A1 PATTERNING PROCESS AND PATTERN SURFACE COATING COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210200083-A1 RESIST COMPOSITION AND PATTERNING PROCESS EIF2B1, EIF2B5, EIF2B3 TDP1 3780/4885KMT2A 2222/4885MAPK1 2466/4885
US-20230280651-A1 RESIST COMPOSITION AND PATTERNING PROCESS EIF2B1, EIF2B5, EIF2B3 TDP1 3780/4885KMT2A 2222/4885MAPK1 2466/4885
US-11693314-B2 Resist composition and patterning process EIF2B1, EIF2B5, EIF2B3 TDP1 3780/4885KMT2A 2222/4885MAPK1 2466/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.