SCHEMBL10164638

SCHEMBL10164638

O=C(Cc1ccccc1)ON=C1c2ccccc2-c2ccccc21

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.57
L3MBTL1 Q9Y468 7/20 0.57
MEN1 O00255 3/20 0.57
KMT2A Q03164 3/20 0.57
MAPT P10636 1/20 0.53
MAPK1 P28482 2/20 0.49
PAM P19021 1/20 0.47
SMN1; SMN2 Q16637 2/20 0.47
TDP1 Q9NUW8 2/20 0.47
HTT P42858 2/20 0.47
HPGD P15428 1/20 0.46
TSHR P16473 1/20 0.46
CYP1A2 P05177 1/20 0.46
CYP3A4 P08684 1/20 0.46
CYP2C19 P33261 1/20 0.46
THRB P10828 1/20 0.44
CES2 O00748 1/20 0.44
CES1 P23141 1/20 0.44
AKR1B1 P15121 1/20 0.44
HCRTR1 O43613 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31667881 1.00 ALDH1A1 (0.57) ALDH1A1L3MBTL1MEN1KMT2AMAPT
SCHEMBL12283297 0.82 L3MBTL1 (0.51) ALDH1A1L3MBTL1MEN1KMT2AMAPT
SCHEMBL921332 0.79 ALDH1A1 (0.53) ALDH1A1L3MBTL1MEN1KMT2AMAPT
SCHEMBL14193659 0.77 LMNA (0.54) ALDH1A1L3MBTL1MEN1KMT2AMAPT
SCHEMBL15286635 0.76 L3MBTL1 (0.57) ALDH1A1L3MBTL1MEN1KMT2AMAPK1
SCHEMBL921266 0.72 ALDH1A1 (0.57) ALDH1A1L3MBTL1MEN1KMT2AMAPT
SCHEMBL14667498 0.71 L3MBTL1 (0.60) ALDH1A1L3MBTL1MEN1KMT2AMAPK1
SCHEMBL1870609 0.71 ALDH1A1 (0.62) ALDH1A1L3MBTL1MEN1KMT2AMAPT
Benzene SCHEMBL28096336 0.71 ALDH1A1 (0.62) ALDH1A1L3MBTL1MEN1KMT2AMAPT
SCHEMBL4675 0.71 ALDH1A1 (0.62) ALDH1A1L3MBTL1MEN1KMT2AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130126860-A1 THIN FILM TRANSISTOR SUBSTRATE DAI NIPPON PRINTING CO., LTD. (JP) 2013-05-23 US disclosed
US-20130126860-A1 THIN FILM TRANSISTOR SUBSTRATE DAI NIPPON PRINTING CO., LTD. (JP) 2013-05-23 US disclosed
US-8173348-B2 Method of forming pattern and composition for forming of organic thin-film for use therein JSR CORPORATION (JP) 2012-05-08 US disclosed
US-8173348-B2 Method of forming pattern and composition for forming of organic thin-film for use therein JSR CORPORATION (JP) 2012-05-08 US disclosed
EP-1626309-B1 Hologram recording material, hologram recording method and holographic optical element FUJIFILM CORP (JP) 2011-07-27 EP disclosed
EP-1492092-B1 Two-photon absorbing optical recording material and two-photon absorbing optical recording and reproducing method FUJIFILM CORP (JP) 2011-04-13 EP disclosed
US-20100239962-A1 TWO-PHOTON ABSORBING OPTICAL RECORDING MATERIAL AND TWO-PHOTON ABSORBING OPTICAL RECORDING AND REPRODUCING METHOD FUJIFILM CORPORATION (JP) 2010-09-23 US disclosed
US-20100239962-A1 TWO-PHOTON ABSORBING OPTICAL RECORDING MATERIAL AND TWO-PHOTON ABSORBING OPTICAL RECORDING AND REPRODUCING METHOD FUJIFILM CORPORATION (JP) 2010-09-23 US disclosed
US-20100233635-A1 METHOD OF FORMING PATTERN AND COMPOSITION FOR FORMING OF ORGANIC THIN-FILM FOR USE THEREIN JSR CORPORATION (JP) 2010-09-16 US disclosed
US-20100233635-A1 METHOD OF FORMING PATTERN AND COMPOSITION FOR FORMING OF ORGANIC THIN-FILM FOR USE THEREIN JSR CORPORATION (JP) 2010-09-16 US disclosed
US-20090303855-A1 TWO-PHOTON-ABSORBING RECORDING MEDIUM, TWO-PHOTON-ABSORBING RECORDING/REPRODUCING METHOD, AND TWO-PHOTON-ABSORBING RECORDING/REPRODUCING APPARATUS FUJIFILM CORPORATION (JP) 2009-12-10 US disclosed
US-7588863-B2 Hologram recording method and hologram recording material FUJIFILM CORPORATION (JP) 2009-09-15 US disclosed
US-7588863-B2 Hologram recording method and hologram recording material FUJIFILM CORPORATION (JP) 2009-09-15 US disclosed
US-7582390-B2 Two-photon absorbing polymerization method, two-photon absorbing optical recording material and two-photon absorbing optical recording method FUJIFILM CORPORATION (JP) 2009-09-01 US disclosed
US-7582390-B2 Two-photon absorbing polymerization method, two-photon absorbing optical recording material and two-photon absorbing optical recording method FUJIFILM CORPORATION (JP) 2009-09-01 US disclosed
US-7582391-B2 Two-photon absorption decolorizable material, two-photon absorption refractive index modulation material, two-photon absorption polymerization material, two-photon absorption polymerization method and three-dimensional optical recording material FUJIFILM CORPORATION (JP) 2009-09-01 US disclosed
US-7582391-B2 Two-photon absorption decolorizable material, two-photon absorption refractive index modulation material, two-photon absorption polymerization material, two-photon absorption polymerization method and three-dimensional optical recording material FUJIFILM CORPORATION (JP) 2009-09-01 US disclosed
US-7531667-B2 Two-photon absorption dye-containing material, three-dimensional refractive index modulation material, three-dimensional absorption index modulation material and three-dimensional optical recording material FUJIFILM CORPORATION (JP) 2009-05-12 US disclosed
US-7531667-B2 Two-photon absorption dye-containing material, three-dimensional refractive index modulation material, three-dimensional absorption index modulation material and three-dimensional optical recording material FUJIFILM CORPORATION (JP) 2009-05-12 US disclosed
WO-2007034616-A1 TWO-PHOTON-ABSORBING RECORDING MEDIUM, TWO-PHOTON-ABSORBING RECORDING/REPRODUCING METHOD, AND TWO-PHOTON-ABSORBING RECORDING/REPRODUCING APPARATUS FUJIFILM CORPORATION (JP) 2007-03-29 WO disclosed