Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | BCHE | P06276 | 1/20 | 0.55 |
| ▸ | NPC1 | O15118 | 2/20 | 0.54 |
| ▸ | RAB9A | P51151 | 2/20 | 0.54 |
| ▸ | FFAR1 | O14842 | 2/20 | 0.51 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.51 |
| ▸ | TSHR | P16473 | 1/20 | 0.51 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.51 |
| ▸ | PPARG | P37231 | 2/20 | 0.51 |
| ▸ | ACACB | O00763 | 1/20 | 0.51 |
| ▸ | LTA4H | P09960 | 1/20 | 0.50 |
| ▸ | PPARD | Q03181 | 1/20 | 0.50 |
| ▸ | PPARA | Q07869 | 1/20 | 0.50 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.49 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.49 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6722051 | 0.94 | BCHE (0.56) | BCHENPC1RAB9AALDH1A1TSHR | |
| SCHEMBL28572476 | 0.91 | BCHE (0.60) | BCHENPC1RAB9AALDH1A1TSHR | |
| SCHEMBL10053088 | 0.91 | BCHE (0.60) | BCHENPC1RAB9AALDH1A1TSHR | |
| SCHEMBL14118337 | 0.88 | BCHE (0.55) | BCHENPC1RAB9AFFAR1ALDH1A1 | |
| SCHEMBL6721888 | 0.88 | BCHE (0.55) | BCHENPC1RAB9AFFAR1ALDH1A1 | |
| SCHEMBL10162228 | 0.87 | ALDH1A1 (0.54) | ALDH1A1TSHRACACBLTA4H | |
| SCHEMBL11858946 | 0.86 | RXRA (0.63) | BCHENPC1RAB9AFFAR1FFAR4 | |
| SCHEMBL10178751 | 0.84 | FFAR1 (0.53) | BCHEFFAR1FFAR4PPARGACACB | |
| SCHEMBL10013594 | 0.84 | BCHE (0.53) | BCHENPC1RAB9AALDH1A1TSHR | |
| SCHEMBL15613870 | 0.83 | FFAR1 (0.59) | NPC1RAB9AFFAR1ALDH1A1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124310-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20090087784-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |