Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.54 |
| ▸ | TSHR | P16473 | 2/20 | 0.54 |
| ▸ | LTA4H | P09960 | 7/20 | 0.53 |
| ▸ | SLC7A5 | Q01650 | 1/20 | 0.51 |
| ▸ | CASP1 | P29466 | 1/20 | 0.47 |
| ▸ | NPY5R | Q15761 | 1/20 | 0.45 |
| ▸ | ACACB | O00763 | 1/20 | 0.45 |
| ▸ | ACACA | Q13085 | 1/20 | 0.45 |
| ▸ | GAA | P10253 | 1/20 | 0.45 |
| ▸ | MAPT | P10636 | 1/20 | 0.45 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.43 |
| ▸ | BAX | Q07812 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10178658 | 0.87 | BCHE (0.55) | ALDH1A1TSHRLTA4HACACB | |
| SCHEMBL18195484 | 0.85 | ALDH1A1 (0.60) | ALDH1A1TSHRLTA4HSLC7A5 | |
| SCHEMBL13918196 | 0.85 | SLC7A5 (0.56) | ALDH1A1TSHRSLC7A5CASP1GAA | |
| SCHEMBL19736611 | 0.85 | LTA4H (0.52) | ALDH1A1TSHRLTA4HSLC7A5ACACB | |
| SCHEMBL825494 | 0.85 | ALDH1A1 (0.60) | ALDH1A1TSHRLTA4HSLC7A5GAA | |
| SCHEMBL9493994 | 0.83 | LTA4H (0.57) | TSHRLTA4HNR1H2BAX | |
| SCHEMBL13144241 | 0.83 | ALDH1A1 (0.51) | ALDH1A1TSHRCASP1NPY5RACACB | |
| SCHEMBL11996670 | 0.83 | PTGS1 (0.58) | ALDH1A1TSHRLTA4H | |
| SCHEMBL12808430 | 0.82 | ALDH1A1 (0.49) | ALDH1A1TSHRSLC7A5CASP1GAA | |
| SCHEMBL6558453 | 0.82 | ALDH1A1 (0.54) | ALDH1A1TSHRSLC7A5GAAMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9946157-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-04-17 | — | — | US | disclosed |
| US-9904168-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2018-02-27 | — | — | US | disclosed |
| US-9563121-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the composition | FUJIFILM CORPORATION (JP) | 2017-02-07 | — | — | US | disclosed |
| US-20160320700-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-11-03 | — | — | US | disclosed |
| US-20160291464-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-10-06 | — | — | US | disclosed |
| US-20160291464-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-10-06 | — | — | US | disclosed |
| US-20160282720-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-09-29 | — | — | US | disclosed |
| US-9235120-B2 | Negative actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, resist-coated mask blanks, resist pattern forming method, and photomask | FUJIFILM CORPORATION (JP) | 2016-01-12 | — | — | US | disclosed |
| US-9235120-B2 | Negative actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, resist-coated mask blanks, resist pattern forming method, and photomask | FUJIFILM CORPORATION (JP) | 2016-01-12 | — | — | US | disclosed |
| US-20140342275-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2014-11-20 | — | — | US | disclosed |
| US-20140178806-A1 | NEGATIVE ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD, AND PHOTOMASK | FUJIFILM CORPORATION (JP) | 2014-06-26 | — | — | US | disclosed |
| US-20140178806-A1 | NEGATIVE ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD, AND PHOTOMASK | FUJIFILM CORPORATION (JP) | 2014-06-26 | — | — | US | disclosed |
| US-20130065934-A1 | FATTY ACID COX INHIBITOR DERIVATIVES AND THEIR USES | CATABASIS PHARMACEUTICALS, INC. (US) | 2013-03-14 | — | — | US | disclosed |
| US-20120035352-A1 | 6-11 Bicyclic Ketolide Derivatives | OR YAT SUN (US) | 2012-02-09 | — | — | US | disclosed |
| US-7189704-B2 | 6-11 bicyclic ketolide derivatives | ENANTA PHARMACEUTICALS, INC. (US) | 2007-03-13 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120035352-A1 | 6-11 Bicyclic Ketolide Derivatives | AKR1C2, AKR1C3, AKR1C1 | ALDH1A1 452/4885TSHR 4172/4885LTA4H 414/4885 |
| US-20130065934-A1 | FATTY ACID COX INHIBITOR DERIVATIVES AND THEIR USES | PTGES, ALOX5, PTGES2 | ALDH1A1 609/4885TSHR 3528/4885LTA4H 104/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.