SCHEMBL10183045

SCHEMBL10183045

CCC(C)c1ccc2cc(OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)S(=O)(=O)NS(=O)(=O)C(F)(F)F)ccc2c1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AKR1C3 P42330 5/20 0.35
AKR1C2 P52895 5/20 0.35
ABCB11 O95342 1/20 0.35
CXCR2 P25025 2/20 0.35
CYP17A1 P05093 1/20 0.34
CYP2C9 P11712 1/20 0.34
CYP2C19 P33261 1/20 0.34
AKR1C1 Q04828 1/20 0.33
PTGS1 P23219 1/20 0.33
HDAC4 P56524 1/20 0.33
HDAC2 Q92769 1/20 0.33
HDAC8 Q9BY41 1/20 0.33
CXCR1 P25024 1/20 0.32
ALDH1A1 P00352 1/20 0.32
TSHR P16473 1/20 0.32
PTPN1 P18031 1/20 0.32
CNR1 P21554 1/20 0.32
CA1 P00915 2/20 0.32
CA2 P00918 2/20 0.32
PTGS2 P35354 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10204886 0.91 AR (0.37) AKR1C3AKR1C2CXCR2CYP17A1CYP2C9
SCHEMBL683002 0.91 CXCR2 (0.40) CXCR2CXCR1ALDH1A1TSHRPTPN1
SCHEMBL10183035 0.84 ABCB11 (0.41) AKR1C3AKR1C2ABCB11CXCR2CYP17A1
SCHEMBL2740729 0.83 CXCR2 (0.41) CXCR2CXCR1ALDH1A1TSHRPTPN1
SCHEMBL12040163 0.81 ALDH1A1 (0.39) CXCR2ALDH1A1TSHRPTPN1CNR1
SCHEMBL18474077 0.80 CXCR2 (0.37) CXCR2CXCR1PTPN1CNR1
SCHEMBL21191392 0.79 CXCR2 (0.41) CXCR2PTGS1HDAC8CXCR1PTPN1
SCHEMBL17175348 0.78 CXCR2 (0.38) CXCR2CXCR1ALDH1A1TSHR
SCHEMBL20444099 0.78 CXCR2 (0.41) CXCR2CXCR1ALDH1A1PTPN1CNR1
SCHEMBL2740730 0.77 CXCR2 (0.42) CXCR2CXCR1ALDH1A1TSHRPTPN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9568824-B2 Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith FUJIFILM CORPORATION (JP) 2017-02-14 US disclosed
US-9005870-B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition FUJIFILM CORPORATION (JP) 2015-04-14 US disclosed
US-20120082939-A1 ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, AND ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2012-04-05 US disclosed
US-20120034559-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING PATTERN THEREWITH FUJIFILM CORPORATION (JP) 2012-02-09 US disclosed
US-20110318693-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2011-12-29 US disclosed
US-20110183263-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2011-07-28 US disclosed