SCHEMBL17175348

SCHEMBL17175348

CCC(C)c1ccc(OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)S(=O)(=O)NC(F)(F)F)cc1

nearest known ligand 0.38

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
CXCR2 P25025 2/20 0.38
ALDH1A1 P00352 4/20 0.38
TSHR P16473 2/20 0.38
MAPT P10636 2/20 0.35
GAA P10253 1/20 0.35
CXCR1 P25024 1/20 0.35
CASP1 P29466 1/20 0.34
NPC1 O15118 2/20 0.33
RAB9A P51151 2/20 0.33
MEN1 O00255 2/20 0.33
KMT2A Q03164 2/20 0.33
TDP1 Q9NUW8 1/20 0.33
HSP90AA1 P07900 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
SLC7A5 Q01650 1/20 0.33
GRIA4 P48058 1/20 0.32
TP53 P04637 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL683002 0.86 CXCR2 (0.40) CXCR2ALDH1A1TSHRMAPTGAA
SCHEMBL682247 0.83 ALDH1A1 (0.43) CXCR2ALDH1A1TSHRMAPTGAA
SCHEMBL10180393 0.81 ALDH1A1 (0.42) CXCR2ALDH1A1TSHRMAPTGAA
SCHEMBL24226214 0.80 CXCR2 (0.38) CXCR2ALDH1A1TSHRMAPTGAA
SCHEMBL14667644 0.80 CXCR2 (0.38) CXCR2ALDH1A1TSHRMAPTGAA
SCHEMBL15831175 0.79 CXCR2 (0.38) CXCR2ALDH1A1TSHRMAPTGAA
SCHEMBL2740729 0.79 CXCR2 (0.41) CXCR2ALDH1A1TSHRMAPTGAA
SCHEMBL10183045 0.78 AKR1C3 (0.35) CXCR2ALDH1A1TSHRCXCR1
SCHEMBL17598857 0.78 ALDH1A1 (0.46) CXCR2ALDH1A1TSHRMAPTGAA
SCHEMBL2740731 0.78 ALDH1A1 (0.46) CXCR2ALDH1A1TSHRMAPTGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150293446-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-10-15 US disclosed