SCHEMBL10186359

SCHEMBL10186359

Cc1cc(C=C(C#N)C#N)cc(O)c1O

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EGFR P00533 10/20 1.00
ERBB2 P04626 1/20 1.00
MAPT P10636 10/20 0.75
MEN1 O00255 9/20 0.75
KMT2A Q03164 9/20 0.75
ALDH1A1 P00352 9/20 0.75
HPGD P15428 7/20 0.75
BLM P54132 7/20 0.75
KDM4E B2RXH2 7/20 0.75
LMNA P02545 6/20 0.75
CYP3A4 P08684 6/20 0.75
CYP2C9 P11712 5/20 0.75
HSD17B10 Q99714 5/20 0.75
NFKB1 P19838 5/20 0.75
PMP22 Q01453 5/20 0.75
ALOX15 P16050 4/20 0.75
SMN1; SMN2 Q16637 4/20 0.75
HIF1A Q16665 4/20 0.75
TDP1 Q9NUW8 4/20 0.75
TSHR P16473 4/20 0.75

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3248262 0.90 EGFR (0.82) EGFRERBB2MAPTMEN1KMT2A
Tyrphostin 25 SCHEMBL239879 0.86 EGFR (1.00) EGFRERBB2MAPTMEN1KMT2A
SCHEMBL10186365 0.82 EGFR (0.70) EGFRERBB2MAPTMEN1KMT2A
SCHEMBL3459584 0.79 EGFR (1.00) EGFRERBB2MAPTMEN1KMT2A
SCHEMBL29457559 0.79 EGFR (1.00) EGFRERBB2MAPTMEN1KMT2A
SCHEMBL10241929 0.78 EGFR (0.70) EGFRERBB2MAPTMEN1KMT2A
SCHEMBL8485552 0.78 EGFR (0.75) EGFRERBB2MAPTMEN1KMT2A
SCHEMBL10144263 0.76 EGFR (0.78) EGFRERBB2MAPTMEN1KMT2A
SCHEMBL12617223 0.75 EGFR (0.70) EGFRERBB2MAPTMEN1KMT2A
SCHEMBL17466923 0.73 ALDH1A1 (0.61) EGFRERBB2MAPTMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2021029395-A1 COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMING METHOD, METHOD FOR FORMING INSULATING FILM, METHOD FOR PRODUCING COMPOUND, IODINE-CONTAINING VINYL POLYMER AND METHOD FOR PRODUCING ACETYLATED DERIVATIVE OF SAME 三菱瓦斯化学株式会社 2021-02-18 WO disclosed
WO-2012012278-A2 COMPOSITIONS AND METHODS FOR THE TREATMENT OF PATHOLOGICAL CONDITION(S) RELATED TO GPR35 AND/OR GPR35-HERG COMPLEX CORNING INCORPORATED (US) 2012-01-26 WO disclosed