Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP19A1 | P11511 | 4/20 | 0.40 |
| ▸ | CYP17A1 | P05093 | 3/20 | 0.40 |
| ▸ | NAAA | Q02083 | 1/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | CASR | P41180 | 1/20 | 0.31 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2602946 | 0.83 | CYP19A1 (0.36) | CYP19A1CYP17A1NAAANPSR1TSHR | |
| SCHEMBL9764361 | 0.81 | CYP19A1 (0.43) | CYP19A1CYP17A1NAAANPSR1TSHR | |
| SCHEMBL686205 | 0.78 | CYP19A1 (0.48) | CYP19A1CYP17A1NAAANPSR1TSHR | |
| SCHEMBL24901084 | 0.76 | CYP19A1 (0.40) | CYP19A1CYP17A1NAAANPSR1TSHR | |
| SCHEMBL9971266 | 0.76 | CYP19A1 (0.40) | CYP19A1CYP17A1NAAANPSR1TSHR | |
| SCHEMBL10257005 | 0.75 | CYP19A1 (0.40) | CYP19A1CYP17A1NAAANPSR1TSHR | |
| SCHEMBL18467939 | 0.75 | CYP19A1 (0.40) | CYP19A1CYP17A1NAAANPSR1TSHR | |
| SCHEMBL686582 | 0.75 | CYP19A1 (0.40) | CYP19A1CYP17A1NAAANPSR1TSHR | |
| SCHEMBL18648367 | 0.75 | CYP19A1 (0.46) | CYP19A1CYP17A1NAAANPSR1TSHR | |
| SCHEMBL13206887 | 0.74 | CYP19A1 (0.35) | CYP19A1CYP17A1NAAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120164574-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-06-28 | — | — | US | disclosed |