SCHEMBL10225995

SCHEMBL10225995

Cc1ccc(S(=O)(=O)O/N=C2/c3c(ccc4cc(SOC(=O)O)ccc34)OC2C)cc1

nearest known ligand 0.32

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.32
CYP2C19 P33261 1/20 0.32
HTT P42858 2/20 0.31
SMN1; SMN2 Q16637 2/20 0.31
LMNA P02545 1/20 0.31
HSP90AA1 P07900 1/20 0.31
MAPT P10636 1/20 0.31
PKM P14618 1/20 0.31
XBP1 P17861 1/20 0.31
MAPK1 P28482 1/20 0.31
MPI P34949 1/20 0.31
RAB9A P51151 1/20 0.31
NPSR1 Q6W5P4 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
MEN1 O00255 2/20 0.30
KMT2A Q03164 2/20 0.30
POLB P06746 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15085467 0.82 ALDH1A1 (0.34) ALDH1A1CYP2C19HTTSMN1; SMN2LMNA
SCHEMBL6124018 0.82 SIRT2 (0.38) ALDH1A1CYP2C19HTTSMN1; SMN2LMNA
SCHEMBL15082832 0.81 ALDH1A1 (0.33) ALDH1A1CYP2C19HTTSMN1; SMN2LMNA
SCHEMBL15085329 0.81 EP300 (0.38) ALDH1A1CYP2C19HTTSMN1; SMN2LMNA
SCHEMBL6124020 0.80 ALDH1A1 (0.32) ALDH1A1CYP2C19HTTSMN1; SMN2LMNA
SCHEMBL17875139 0.80 HTT (0.41) ALDH1A1CYP2C19HTTSMN1; SMN2LMNA
SCHEMBL29559396 0.80 HTT (0.41) ALDH1A1CYP2C19HTTSMN1; SMN2LMNA
SCHEMBL6124010 0.80 HTT (0.41) ALDH1A1CYP2C19HTTSMN1; SMN2LMNA
SCHEMBL6124011 0.74 ALDH1A1 (0.38) ALDH1A1CYP2C19HTTSMN1; SMN2LMNA
SCHEMBL15082830 0.71 HSP90AA1 (0.35) ALDH1A1CYP2C19HTTSMN1; SMN2HSP90AA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120107563-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERN, MEMS STRUCTURE, METHOD FOR PRODUCING THE STRUCTURE, METHOD FOR DRY ETCHING, METHOD FOR WET ETCHING, MEMS SHUTTER DEVICE, AND IMAGE DISPLAY APPARATUS FUJIFILM CORPORATION (JP) 2012-05-03 US disclosed