Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 5/20 | 0.34 |
| ▸ | EPHX2 | P34913 | 4/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.31 |
| ▸ | CTSV | O60911 | 1/20 | 0.31 |
| ▸ | CTSL | P07711 | 1/20 | 0.31 |
| ▸ | CTSS | P25774 | 1/20 | 0.31 |
| ▸ | CTSK | P43235 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19661062 | 0.87 | L3MBTL1 (0.41) | HSD11B1EPHX2L3MBTL1CTSVCTSL | |
| SCHEMBL12963704 | 0.81 | TSHR (0.41) | HSD11B1EPHX2EPHX1 | |
| SCHEMBL824210 | 0.81 | HSD11B1 (0.33) | HSD11B1EPHX2L3MBTL1 | |
| SCHEMBL15279656 | 0.79 | HSD11B1 (0.35) | HSD11B1EPHX2EPHX1 | |
| SCHEMBL47428 | 0.78 | HSD11B1 (0.32) | HSD11B1EPHX2L3MBTL1EPHX1 | |
| SCHEMBL12198426 | 0.76 | HSD11B1 (0.30) | HSD11B1 | |
| SCHEMBL26939520 | 0.75 | EPHX2 (0.36) | HSD11B1EPHX2EPHX1 | |
| SCHEMBL2740747 | 0.75 | HSD11B1 (0.33) | HSD11B1EPHX2EPHX1 | |
| SCHEMBL2740748 | 0.75 | HSD11B1 (0.33) | HSD11B1EPHX2EPHX1 | |
| SCHEMBL546734 | 0.74 | EPHX1 (0.47) | HSD11B1EPHX2L3MBTL1EPHX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124310-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-7977029-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2011-07-12 | — | — | US | disclosed |
| US-7887988-B2 | Acid generator; irradiating with actinic radiation | FUJIFILM CORPORATION (JP) | 2011-02-15 | — | — | US | disclosed |
| US-7625690-B2 | Acid generator; exposure to actinic radiation | FUJIFILM CORPORATION (JP) | 2009-12-01 | — | — | US | disclosed |
| US-20090087784-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |
| US-20080318159-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2008-12-25 | — | — | US | disclosed |