Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 1/20 | 0.47 |
| ▸ | HSD11B1 | P28845 | 8/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.43 |
| ▸ | EPHX2 | P34913 | 5/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
| ▸ | CHRM2 | P08172 | 2/20 | 0.38 |
| ▸ | CHRM4 | P08173 | 2/20 | 0.38 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.38 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.38 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28925025 | 1.00 | EPHX1 (0.47) | EPHX1HSD11B1L3MBTL1EPHX2HSD17B10 | |
| SCHEMBL547344 | 0.84 | L3MBTL1 (0.49) | EPHX1HSD11B1L3MBTL1EPHX2 | |
| SCHEMBL12936721 | 0.81 | NAAA (0.45) | EPHX1HSD11B1L3MBTL1EPHX2 | |
| SCHEMBL28470696 | 0.80 | EPHX1 (0.45) | EPHX1HSD11B1L3MBTL1EPHX2CYP2C9 | |
| SCHEMBL16435703 | 0.80 | HSD11B1 (0.43) | EPHX1HSD11B1L3MBTL1EPHX2CYP2C9 | |
| SCHEMBL2619501 | 0.80 | HSD11B1 (0.36) | EPHX1HSD11B1L3MBTL1EPHX2CHRM2 | |
| SCHEMBL5988515 | 0.79 | HSD11B1 (0.46) | EPHX1HSD11B1L3MBTL1EPHX2CYP2C9 | |
| SCHEMBL3905357 | 0.79 | HSD11B1 (0.46) | EPHX1HSD11B1EPHX2CYP2C9 | |
| SCHEMBL19185373 | 0.79 | HSD11B1 (0.49) | EPHX1HSD11B1EPHX2CYP2C9 | |
| SCHEMBL13849147 | 0.79 | L3MBTL1 (0.36) | EPHX1HSD11B1L3MBTL1EPHX2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4689033-A1 | COMPOSITIONS COMPRISING ADAMANTYL ESTER-CONTAINING COMPOUNDS | The Procter & Gamble Company (US) | 2026-02-11 | — | — | EP | disclosed |
| US-20240336868-A1 | COMPOSITIONS COMPRISING ADAMANTYL ESTER-CONTAINING COMPOUNDS | THE PROCTER & GAMBLE COMPANY | 2024-10-10 | — | — | US | disclosed |
| WO-2024211640-A1 | COMPOSITIONS COMPRISING ADAMANTYL ESTER-CONTAINING COMPOUNDS | THE PROCTER & GAMBLE COMPANY (US) | 2024-10-10 | — | — | WO | disclosed |
| US-11852970-B2 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-12-26 | — | — | US | disclosed |
| US-11852970-B2 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-12-26 | — | — | US | disclosed |
| CN-113387829-B | Preparation method of shakubiqu | 凯特立斯（深圳）科技有限公司 | 2023-04-07 | — | — | CN | disclosed |
| CN-113387829-A | Preparation method of shakubiqu | 凯特立斯（深圳）科技有限公司 | 2021-09-14 | — | — | CN | disclosed |
| US-11046670-B2 | Piperazinyl norbenzomorphan compounds and methods for using the same | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2021-06-29 | — | — | US | disclosed |
| US-20200262787-A1 | OPTICAL COMPONENT FORMING COMPOSITION AND CURED PRODUCT THEREOF | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-08-20 | — | — | US | disclosed |
| US-10319735-B2 | Method for manufacturing semiconductor device | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2019-06-11 | — | — | US | disclosed |
| US-7001706-B2 | Sulfonate and a resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2006-02-21 | — | — | US | disclosed |
| US-20050164119-A1 | Monomer having fluorine-containing acetalor ketal structure, polymer thereof, and chemical-amplification-type resist composition as well as process for formation of pattern with use of the same | NEC CORPORATION (JP) | 2005-07-28 | — | — | US | disclosed |
| US-20050014095-A1 | Sulfonate and a resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-01-20 | — | — | US | disclosed |
| US-20040265732-A1 | Unsaturated monomers, polymers, chemically amplified resist composition, and process of pattern formation | NEC CORPORATION (JP) | 2004-12-30 | — | — | US | disclosed |
| US-6800419-B2 | FOR USE AS CHEMICALLY-AMPLIFIED RESIST FOR MICROFABRICATION UTILIZING DEEP ULTRAVIOLET RAYS AND EXHIBITS EXCELLENT FILM THICKNESS UNIFORMITY AND STORAGE STABILITY | JSR CORPORATION (JP) | 2004-10-05 | — | — | US | disclosed |
| US-6710188-B2 | VINYL COPOLYMER HAVING 3-OXO-4-OXABICYCLO(3.2.1)OCTANE-2-YL GROUP | NEC CORPORATION (JP) | 2004-03-23 | — | — | US | disclosed |
| US-20030224297-A1 | Chemically amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer | NEC CORPORATION | 2003-12-04 | — | — | US | disclosed |
| US-20030203307-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-10-30 | — | — | US | disclosed |
| US-6639084-B2 | Comprises vinyl polymer having 3-oxo-4-oxabicyclo(3.2.1) octane-2-yl group; sensitive to far-ultraviolet light; imaging; for use with semiconductor wafers; improved resistance against dry etching and adhesion to substrates | NEC CORPORATION (JP) | 2003-10-28 | — | — | US | disclosed |
| US-20030097008-A1 | Chemical amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer | NEC CORPORATION | 2003-05-22 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11852970-B2 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | SLC39A11, CROCC, TERB1 | EPHX1 787/4885HSD11B1 2144/4885L3MBTL1 685/4885 |
| US-11046670-B2 | Piperazinyl norbenzomorphan compounds and methods for using the same | GAP43, NCDN, NLN | EPHX1 2314/4885HSD11B1 2532/4885L3MBTL1 502/4885 |
| US-20200262787-A1 | OPTICAL COMPONENT FORMING COMPOSITION AND CURED PRODUCT THEREOF | TERB1, C5, TERT | EPHX1 165/4885HSD11B1 4662/4885L3MBTL1 3252/4885 |
| US-20030097008-A1 | Chemical amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer | LIG1, OXGR1, ITGA1 | EPHX1 3199/4885HSD11B1 2866/4885L3MBTL1 576/4885 |
| US-20030224297-A1 | Chemically amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer | LIG1, LIG4, OXGR1 | EPHX1 2986/4885HSD11B1 2731/4885L3MBTL1 612/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.