SCHEMBL10236326

SCHEMBL10236326

C(=C1CCCCC1)c1c[nH]c2ccccc12

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 3/20 0.60
▸ LMNA P02545 3/20 0.60
▸ HPGD P15428 3/20 0.60
▸ ALDH1A1 P00352 2/20 0.60
▸ MAPT P10636 2/20 0.60
▸ MEN1 O00255 1/20 0.60
▸ KMT2A Q03164 1/20 0.60
▸ SMN1; SMN2 Q16637 1/20 0.60
▸ CYP2A6 P11509 1/20 0.53
▸ IMPDH2 P12268 1/20 0.53
▸ NPC1 O15118 1/20 0.51
▸ RAB9A P51151 1/20 0.51
▸ HTT P42858 2/20 0.49
▸ MAPK1 P28482 1/20 0.48
▸ NTRK1 P04629 2/20 0.46
▸ DAPK3 O43293 1/20 0.46
▸ PRKD3 O94806 1/20 0.46
▸ MAP4K4 O95819 1/20 0.46
▸ ABL1 P00519 1/20 0.46
▸ LCK P06239 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5604224 0.78 ALDH1A1 (0.76) KDM4ELMNAHPGDALDH1A1MAPT
SCHEMBL5604228 0.78 ALDH1A1 (0.76) KDM4ELMNAHPGDALDH1A1MAPT
SCHEMBL5605289 0.78 ALDH1A1 (0.76) KDM4ELMNAHPGDALDH1A1MAPT
SCHEMBL27821745 0.73 CYP2A6 (0.69) KDM4ELMNAHPGDALDH1A1MAPT
SCHEMBL10489040 0.73 CYP2A6 (0.69) KDM4ELMNAHPGDALDH1A1MAPT
SCHEMBL27943960 0.72 CYP2A6 (0.58) KDM4ELMNAHPGDALDH1A1MAPT
SCHEMBL31633258 0.70 KDM4E (0.49) KDM4ELMNAHPGDALDH1A1MAPT
3-Formylindole SCHEMBL19180195 0.70 CYP2A6 (0.70) KDM4ELMNAHPGDALDH1A1MAPT
3-Formylindole SCHEMBL56373 0.70 CYP2A6 (1.00) KDM4ELMNAHPGDALDH1A1MAPT
SCHEMBL13759052 0.70 CYP2A6 (0.64) KDM4ELMNAHPGDALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2012026621-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH FUJIFILM CORPORATION (JP) 2012-03-01 — — WO disclosed
Send feedback