Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DGAT1 | O75907 | 1/20 | 0.45 |
| ▸ | MMP8 | P22894 | 1/20 | 0.38 |
| ▸ | CA1 | P00915 | 1/20 | 0.35 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
| ▸ | CA7 | P43166 | 1/20 | 0.35 |
| ▸ | AAK1 | Q2M2I8 | 7/20 | 0.34 |
| ▸ | CTSS | P25774 | 2/20 | 0.32 |
| ▸ | CTSK | P43235 | 2/20 | 0.32 |
| ▸ | CTSL | P07711 | 1/20 | 0.32 |
| ▸ | CTSB | P07858 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | APLNR | P35414 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15935717 | 0.85 | MMP8 (0.37) | DGAT1MMP8 | |
| SCHEMBL9911580 | 0.83 | DGAT1 (0.45) | DGAT1MMP8CA1CA2CA7 | |
| SCHEMBL15172838 | 0.82 | MMP8 (0.39) | MMP8 | |
| SCHEMBL18560733 | 0.81 | MMP8 (0.41) | DGAT1MMP8 | |
| SCHEMBL15203352 | 0.81 | MMP8 (0.37) | DGAT1MMP8MEN1KMT2A | |
| SCHEMBL13447889 | 0.81 | MMP8 (0.37) | DGAT1MMP8 | |
| SCHEMBL29321217 | 0.80 | MMP8 (0.34) | MMP8 | |
| SCHEMBL28077386 | 0.80 | DGAT1 (0.41) | DGAT1MMP8CA1CA2CA7 | |
| SCHEMBL15521040 | 0.79 | MMP8 (0.40) | MMP8 | |
| SCHEMBL4410190 | 0.79 | MMP8 (0.33) | MMP8 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2927749-A1 | ORGANIC TREATMENT SOLUTION FOR PATTERNING OF CHEMICALLY AMPLIFIED RESIST FILM, CONTAINER FOR ORGANIC TREATMENT SOLUTION FOR PATTERNING OF CHEMICALLY AMPLIFIED RESIST FILM, AND PATTERN FORMATION METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE USING SAME | FUJIFILM Corporation (JP) | 2015-10-07 | — | — | EP | disclosed |
| EP-2434343-A1 | Resist composition, resist film therefrom and method of forming pattern therewith | Fujifilm Corporation (JP) | 2012-03-28 | — | — | EP | disclosed |
| EP-2413191-A1 | Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith | Fujifilm Corporation (JP) | 2012-02-01 | — | — | EP | disclosed |
| WO-2011065594-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, FILM FORMED USING THE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-06-03 | — | — | WO | disclosed |
| WO-2011043481-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2011-04-14 | — | — | WO | disclosed |
| WO-2010067905-A2 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-06-17 | — | — | WO | disclosed |