SCHEMBL10247238

SCHEMBL10247238

Cc1ccc(C(=N)C(F)(F)F)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.46
SMN1; SMN2 Q16637 2/20 0.46
CA2 P00918 1/20 0.45
CES2 O00748 3/20 0.42
CES1 P23141 3/20 0.42
LMNA P02545 2/20 0.42
SRD5A2 P31213 1/20 0.41
HDAC1 Q13547 1/20 0.41
HDAC6 Q9UBN7 1/20 0.41
TDP1 Q9NUW8 3/20 0.38
ACHE P22303 3/20 0.38
PKM P14618 2/20 0.38
HTT P42858 2/20 0.38
ATM Q13315 2/20 0.38
NPSR1 Q6W5P4 2/20 0.38
HPGD P15428 1/20 0.38
NLRP1 Q9C000 1/20 0.38
GAA P10253 1/20 0.38
MEN1 O00255 1/20 0.38
NTSR1 P30989 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26325162 0.82 HDAC6 (0.31) CA2HDAC6
SCHEMBL16665582 0.78 PLOD2 (0.45) CA2CES2CES1CYP1A1CYP1B1
SCHEMBL29723918 0.76 LMNA (0.48) ALDH1A1CA2CES2CES1LMNA
SCHEMBL4516554 0.76 CES2 (0.42) CA2CES2CES1LMNAHDAC1
SCHEMBL29723914 0.76 PRSS1 (0.55) ALDH1A1SMN1; SMN2CES2CES1LMNA
SCHEMBL12198147 0.76 PRSS1 (0.55) ALDH1A1SMN1; SMN2CA2CES2CES1
SCHEMBL29723909 0.76 HTT (0.45) ALDH1A1SMN1; SMN2LMNAHTTNPSR1
SCHEMBL14276747 0.75 CES1 (0.52) ALDH1A1CES2CES1SRD5A2HDAC1
SCHEMBL24684593 0.73 ESR1 (0.52) CES2CES1SRD5A2GSK3B
SCHEMBL20794341 0.73 CA1 (0.53) ALDH1A1CA2TDP1HTTATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110437230-B Tertiary amine compound, diphosphine ligand, intermediate and preparation method thereof 中国科学院上海有机化学研究所 2022-06-21 CN disclosed
US-9760003-B2 Pattern forming method and actinic-ray- or radiation-sensitive resin composition FUJIFILM CORPORATION (JP) 2017-09-12 US disclosed
EP-2413191-A1 Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith Fujifilm Corporation (JP) 2012-02-01 EP disclosed