Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PDE2A | O00408 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18671985 | 0.86 | CYP2C9 (0.33) | PDE2A | |
| SCHEMBL17340611 | 0.85 | CNR1 (0.33) | PDE2A | |
| SCHEMBL14255416 | 0.84 | ACACB (0.38) | PDE2A | |
| SCHEMBL19266106 | 0.83 | ALDH1A1 (0.35) | PDE2A | |
| SCHEMBL19266084 | 0.81 | ESR1 (0.32) | PDE2A | |
| SCHEMBL12347397 | 0.81 | PDE2A (0.33) | PDE2A | |
| SCHEMBL18467472 | 0.81 | PDE2A (0.30) | PDE2A | |
| SCHEMBL15869208 | 0.80 | SLC2A1 (0.37) | PDE2A | |
| SCHEMBL15869196 | 0.80 | PDE2A (0.35) | PDE2A | |
| SCHEMBL19266187 | 0.79 | PDE2A (0.32) | PDE2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2360525-B1 | Chemically amplified positive resist composition and pattern forming process | SHINETSU CHEMICAL CO (JP) | 2017-08-23 | — | — | EP | disclosed |
| US-20170037167-A1 | POLYMER COMPOUND, POSITIVE RESIST COMPOSITION, LAMINATE, AND RESIST PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-02-09 | — | — | US | disclosed |
| EP-2955576-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2015-12-16 | — | — | EP | disclosed |
| EP-2560049-A2 | Composition for forming a silicon-containing resist underlayer film and patterning processing using the same | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-02-20 | — | — | EP | disclosed |
| EP-2551722-A1 | Chemically amplified positive resist composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-01-30 | — | — | EP | disclosed |
| EP-2362268-B1 | Polymer, chemically amplified positive resist compositions and pattern forming process | SHINETSU CHEMICAL CO (JP) | 2013-01-23 | — | — | EP | disclosed |
| EP-2413191-A1 | Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith | Fujifilm Corporation (JP) | 2012-02-01 | — | — | EP | disclosed |
| EP-2360525-A1 | Chemically amplified positive resist composition and pattern forming process | Shin-Etsu Chemical Co., Ltd. (JP) | 2011-08-24 | — | — | EP | disclosed |
| EP-2360527-A1 | Chemically amplified positive resist composition for EB or EUV lithography and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2011-08-24 | — | — | EP | disclosed |
| EP-1925979-A1 | Positive photosensitive composition, polymer compound used for the positive photosensitive composition, production method of the polymer compound, and pattern forming method using the positive photosensitive composition | FUJIFILM Corporation (JP) | 2008-05-28 | — | — | EP | disclosed |
| EP-1906241-A1 | Resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2008-04-02 | — | — | EP | disclosed |