Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C9 | P11712 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | PDE2A | O00408 | 1/20 | 0.33 |
| ▸ | ESR1 | P03372 | 1/20 | 0.32 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | MIF | P14174 | 1/20 | 0.30 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.30 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.30 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10248838 | 0.86 | PDE2A (0.31) | PDE2A | |
| SCHEMBL12347397 | 0.84 | PDE2A (0.33) | PDE2A | |
| SCHEMBL18467472 | 0.84 | PDE2A (0.30) | PDE2A | |
| SCHEMBL15869196 | 0.82 | PDE2A (0.35) | PDE2AESR1HIF1AALDH1A1TSHR | |
| SCHEMBL15869208 | 0.82 | SLC2A1 (0.37) | PDE2AESR1HIF1AALDH1A1TSHR | |
| SCHEMBL133972 | 0.82 | TSHR (0.41) | ALDH1A1TSHRCYP1A2CYP2D6CYP2C19 | |
| SCHEMBL825496 | 0.81 | ALDH1A1 (0.47) | CYP2C9HSD17B10PDE2AALDH1A1TSHR | |
| SCHEMBL17402207 | 0.81 | ALDH1A1 (0.41) | PDE2AALDH1A1TSHRCYP1A2 | |
| SCHEMBL18478346 | 0.80 | PDE2A (0.32) | PDE2AESR1HIF1A | |
| SCHEMBL18372579 | 0.79 | ELANE (0.49) | PDE2AESR1HIF1AALDH1A1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9604921-B2 | Sulfonium salt, resist composition and resist pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-03-28 | — | — | US | disclosed |