SCHEMBL12347397

SCHEMBL12347397

CCC(C)(C)Oc1ccc(C(CC(C)C)C(C)(C)C)cc1

nearest known ligand 0.33

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
PDE2A O00408 1/20 0.33
CNR1 P21554 3/20 0.31
CNR2 P34972 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19954387 0.85 CNR1 (0.35) PDE2ACNR1CNR2
SCHEMBL18671985 0.84 CYP2C9 (0.33) PDE2A
SCHEMBL10248838 0.81 PDE2A (0.31) PDE2A
SCHEMBL17402207 0.80 ALDH1A1 (0.41) PDE2A
SCHEMBL18467472 0.80 PDE2A (0.30) PDE2A
SCHEMBL25686027 0.80 PDE2A (0.31) PDE2A
SCHEMBL14227866 0.79 ALDH1A1 (0.46)
SCHEMBL15869196 0.78 PDE2A (0.35) PDE2A
SCHEMBL15869208 0.78 SLC2A1 (0.37) PDE2A
SCHEMBL133972 0.78 TSHR (0.41)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2362268-A1 Polymer, chemically amplified positive resist composition and pattern forming process Shin-Etsu Chemical Co., Ltd. (JP) 2011-08-31 EP disclosed