Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.50 |
| ▸ | LMNA | P02545 | 4/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.50 |
| ▸ | MAPT | P10636 | 4/20 | 0.47 |
| ▸ | POLB | P06746 | 4/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.47 |
| ▸ | TSHR | P16473 | 3/20 | 0.47 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.47 |
| ▸ | ERCC1 | P07992 | 1/20 | 0.47 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.47 |
| ▸ | FEN1 | P39748 | 1/20 | 0.47 |
| ▸ | ERCC4 | Q92889 | 1/20 | 0.47 |
| ▸ | HPGD | P15428 | 1/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 9/20 | 0.44 |
| ▸ | MEN1 | O00255 | 8/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 5/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.44 |
| ▸ | USP2 | O75604 | 1/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.42 |
| ▸ | HTT | P42858 | 2/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10267905 | 0.93 | LMNA (0.54) | ALDH1A1LMNAKDM4EMAPTPOLB | |
| SCHEMBL10262179 | 0.87 | ALDH1A1 (0.56) | ALDH1A1LMNAKDM4EMAPTPOLB | |
| SCHEMBL10261684 | 0.84 | HEXA (0.51) | ALDH1A1KDM4EMAPTTSHRCYP1A2 | |
| SCHEMBL10261860 | 0.84 | HDAC3 (0.53) | ALDH1A1LMNAKDM4EMAPTPOLB | |
| SCHEMBL10262440 | 0.84 | HPGD (0.44) | ALDH1A1LMNAKDM4EMAPTPOLB | |
| SCHEMBL16865687 | 0.83 | ALDH1A1 (0.47) | ALDH1A1LMNAKDM4ETSHRHPGD | |
| SCHEMBL12285609 | 0.83 | MEN1 (0.56) | ALDH1A1LMNAMAPTPOLBTDP1 | |
| SCHEMBL10262050 | 0.82 | LMNA (0.59) | ALDH1A1LMNAKDM4EMAPTPOLB | |
| SCHEMBL21034453 | 0.81 | PRMT1 (0.56) | ALDH1A1LMNAKDM4EMAPTPOLB | |
| SCHEMBL10267904 | 0.80 | ALDH1A1 (0.60) | ALDH1A1LMNAKDM4EMAPTPOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8211613-B2 | prints, color filters, electronics, layer insulation films, wire covering films, optics, circuits, antireflection films, holograms and construction materials comprising a cured mixture of photosensitive resins and photoiniitiators having a naphthalimide structure | DAI NIPPON PRINTING CO., LTD. (JP) | 2012-07-03 | — | — | US | disclosed |
| US-8211613-B2 | prints, color filters, electronics, layer insulation films, wire covering films, optics, circuits, antireflection films, holograms and construction materials comprising a cured mixture of photosensitive resins and photoiniitiators having a naphthalimide structure | DAI NIPPON PRINTING CO., LTD. (JP) | 2012-07-03 | — | — | US | disclosed |
| US-20080275154-A1 | Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition | SAKAYORI KATSUYA | 2008-11-06 | — | — | US | disclosed |
| US-20080275154-A1 | Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition | SAKAYORI KATSUYA | 2008-11-06 | — | — | US | disclosed |
| US-7410746-B2 | Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition | DAI NIPPON PRINTING CO., LTD. (JP) | 2008-08-12 | — | — | US | disclosed |
| US-7410746-B2 | Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition | DAI NIPPON PRINTING CO., LTD. (JP) | 2008-08-12 | — | — | US | disclosed |