Known targets — ChEMBL curated mechanism
ABL1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB2AGTR1BCL2BCL2A1BCL2L1BCL2L10BCL2L2BCRBRAFCHRM1CHRNA10CHRNA9DRD1DRD2DRD3DRD4DRD5EGFRF2FLT1FLT4GCKGHSRGNRHRGRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BHTR1AHTR1BHTR1DHTR2AHTR2CHTR3AIDH2KDRKITMAOBMCL1MTTPPP4HBPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PIKFYVEROCK1ROCK2SLC18A2SLC6A2SLC6A3SLC6A4TACR1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8gyrAgyrBparCparEpol
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAOB known ✓ | P27338 | 1/20 | 0.48 |
| ▸ | P4HB known ✓ | P07237 | 1/20 | 0.42 |
| ▸ | EGFR known ✓ | P00533 | 1/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 7/20 | 0.51 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.51 |
| ▸ | HPGD | P15428 | 4/20 | 0.51 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.51 |
| ▸ | GAA | P10253 | 1/20 | 0.51 |
| ▸ | MAOA | P21397 | 3/20 | 0.50 |
| ▸ | CASP3 | P42574 | 4/20 | 0.49 |
| ▸ | MAPT | P10636 | 7/20 | 0.48 |
| ▸ | MAPK1 | P28482 | 4/20 | 0.48 |
| ▸ | TDP1 | Q9NUW8 | 4/20 | 0.48 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.48 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.48 |
| ▸ | TSHR | P16473 | 2/20 | 0.48 |
| ▸ | LMNA | P02545 | 1/20 | 0.48 |
| ▸ | HTT | P42858 | 1/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 7/20 | 0.44 |
| ▸ | MEN1 | O00255 | 6/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL51539 | 0.89 | MAOA (0.56) | KDM4EALDH1A1HPGDHSD17B10GAA | |
| SCHEMBL29779636 | 0.89 | MAOA (0.56) | KDM4EALDH1A1HPGDHSD17B10GAA | |
| SCHEMBL28307982 | 0.87 | MAOA (0.54) | KDM4EALDH1A1HPGDHSD17B10GAA | |
| Benzene SCHEMBL28142453 | 0.87 | MAOA (0.54) | KDM4EALDH1A1HPGDHSD17B10GAA | |
| SCHEMBL9462895 | 0.87 | MAOA (0.54) | KDM4EALDH1A1HPGDHSD17B10GAA | |
| Ammonia Solution, Strong SCHEMBL27791525 | 0.87 | MAOA (0.54) | KDM4EALDH1A1HPGDHSD17B10GAA | |
| Methane SCHEMBL28144630 | 0.87 | MAOA (0.54) | KDM4EALDH1A1HPGDHSD17B10GAA | |
| Trifluoromethanesulfonic Acid SCHEMBL1026933 | 0.87 | MAOA (0.47) | KDM4EALDH1A1HPGDHSD17B10GAA | |
| Trifluoromethanesulfonic Acid SCHEMBL27913668 | 0.85 | MAOA (0.46) | KDM4EALDH1A1HPGDHSD17B10GAA | |
| SCHEMBL115116 | 0.84 | TSHR (0.48) | KDM4EALDH1A1HPGDHSD17B10GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104969127-B | Compound, lower layer film for lithography forming material, lower layer film for lithography and pattern forming method | 三菱瓦斯化学株式会社 | 2019-11-26 | — | — | CN | disclosed |
| CN-106094440-B | Lower layer film for lithography forming material, lower layer film for lithography and pattern forming method | 三菱瓦斯化学株式会社 | 2019-11-22 | — | — | CN | disclosed |
| CN-106462072-A | Lithographic film formation material, composition for lithographic film formation, lithographic film, pattern formation method, and purification method | 三菱瓦斯化学株式会社 | 2017-02-22 | — | — | CN | disclosed |
| EP-2273968-A1 | COMPOSITIONS AND METHODS INCORPORATING PHOTOCATALYSTS | THE PROCTER & GAMBLE COMPANY (US) | 2011-01-19 | — | — | EP | disclosed |
| WO-2009140076-A1 | COMPOSITIONS AND METHODS INCORPORATING PHOTOCATALYSTS | THE PROCTER & GAMBLE COMPANY (US) | 2009-11-19 | — | — | WO | disclosed |