Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SIGMAR1 | Q99720 | 3/20 | 0.41 |
| ▸ | POLB | P06746 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 3/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
| ▸ | CASR | P41180 | 1/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.35 |
| ▸ | BCHE | P06276 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | IDO1 | P14902 | 1/20 | 0.33 |
| ▸ | ANPEP | P15144 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL144037 | 0.87 | SIGMAR1 (0.42) | SIGMAR1POLBMEN1KMT2AL3MBTL1 | |
| Hydrochloric Acid SCHEMBL8927852 | 0.86 | SIGMAR1 (0.41) | SIGMAR1POLBMEN1KMT2AL3MBTL1 | |
| SCHEMBL10938990 | 0.72 | SIGMAR1 (0.49) | SIGMAR1POLBSMN1; SMN2THRBIDO1 | |
| SCHEMBL1116631 | 0.72 | SIGMAR1 (0.44) | SIGMAR1POLBMEN1KMT2AL3MBTL1 | |
| SCHEMBL3413593 | 0.72 | SIGMAR1 (0.65) | SIGMAR1POLBMEN1KMT2ACASR | |
| SCHEMBL16714856 | 0.72 | SIGMAR1 (0.53) | SIGMAR1POLBMEN1KMT2AL3MBTL1 | |
| SCHEMBL138740 | 0.70 | TDP1 (0.41) | MEN1KMT2AL3MBTL1NPSR1SMN1; SMN2 | |
| SCHEMBL16714867 | 0.70 | SIGMAR1 (0.54) | SIGMAR1POLBMEN1KMT2AL3MBTL1 | |
| SCHEMBL57189 | 0.70 | — | — | |
| SCHEMBL10939504 | 0.70 | SIGMAR1 (0.53) | SIGMAR1POLBMEN1KMT2ACASR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12261143-B2 | Method of manufacturing substrate layered body and layered body | MITSUI CHEMICALS, INC. (JP) | 2025-03-25 | — | — | US | disclosed |
| WO-2025023139-A1 | LAMINATE AND LAMINATE PRODUCTION METHOD | 三井化学株式会社 | 2025-01-30 | — | — | WO | disclosed |
| WO-2025005084-A1 | SUBSTRATE LAMINATE | 三井化学株式会社 | 2025-01-02 | — | — | WO | disclosed |
| WO-2024225232-A1 | SEMICONDUCTOR STRUCTURE AND METHOD FOR PRODUCING SAME | 三井化学株式会社 | 2024-10-31 | — | — | WO | disclosed |
| WO-2024177116-A1 | PRODUCTION METHOD FOR SEMICONDUCTOR CHIP WITH RESIN LAYER AND PRODUCTION METHOD FOR SUBSTRATE LAMINATE | 三井化学株式会社 | 2024-08-29 | — | — | WO | disclosed |
| WO-2024177149-A1 | SEMICONDUCTOR STRUCTURE AND METHOD FOR PRODUCING SAME | 三井化学株式会社 | 2024-08-29 | — | — | WO | disclosed |
| WO-2024177074-A1 | METHOD FOR MANUFACTURING SUBSTRATE LAMINATE | 三井化学株式会社 | 2024-08-29 | — | — | WO | disclosed |
| WO-2024172044-A1 | METHOD FOR MANUFACTURING SUBSTRATE LAYERED BODY, LAYERED BODY, AND SUBSTRATE LAYERED BODY | 三井化学株式会社 | 2024-08-22 | — | — | WO | disclosed |
| WO-2024166789-A1 | SEMICONDUCTOR STRUCTURE AND PRODUCTION METHOD FOR SAME | 三井化学株式会社 | 2024-08-15 | — | — | WO | disclosed |
| WO-2024162446-A1 | SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURING SAME | 三井化学株式会社 | 2024-08-08 | — | — | WO | disclosed |
| WO-2020235420-A1 | METHOD FOR PRODUCING LIGHT EMITTING PARTICLES, LIGHT EMITTING PARTICLES, LIGHT EMITTING PARTICLE DISPERSION, INK COMPOSITION AND LIGHT EMITTING ELEMENT | DIC株式会社 (JP) | 2020-11-26 | — | — | WO | disclosed |
| US-20200347265-A1 | SEMICONDUCTOR FILM COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR FILM COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR MEMBER, METHOD FOR MANUFACTURING SEMICONDUCTOR PROCESSING MATERIAL, AND SEMICONDUCTOR DEVICE | MITSUI CHEMICALS, INC. (JP) | 2020-11-05 | — | — | US | disclosed |
| EP-3379565-B1 | SEMICONDUCTOR FILM COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR FILM COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR MEMBER, METHOD FOR MANUFACTURING PROCESSING MATERIAL FOR SEMICONDUCTOR, AND SEMICONDUCTOR DEVICE | MITSUI CHEMICALS INC (JP) | 2020-10-14 | — | — | EP | disclosed |
| US-10752805-B2 | Semiconductor film composition, method for manufacturing semiconductor film composition, method for manufacturing semiconductor member, method for manufacturing semiconductor processing material, and semiconductor device | MITSUI CHEMICALS, INC. (JP) | 2020-08-25 | — | — | US | disclosed |
| EP-3616903-A1 | SUBSTRATE LAMINATE AND METHOD FOR MANUFACTURING SUBSTRATE LAMINATE | Mitsui Chemicals, Inc. (JP) | 2020-03-04 | — | — | EP | disclosed |
| US-20200048515-A1 | SUBSTRATE LAMINATED BODY AND METHOD OF MANUFACTURING SUBSTRATE LAMINATED BODY | MITSUI CHEMICALS, INC. (JP) | 2020-02-13 | — | — | US | disclosed |
| CN-110545997-A | Substrate laminate and method for manufacturing substrate laminate | MITSUI CHEMICALS INC | 2019-12-06 | — | — | CN | disclosed |
| US-20180334588-A1 | SEMICONDUCTOR FILM COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR FILM COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR MEMBER, METHOD FOR MANUFACTURING SEMICONDUCTOR PROCESSING MATERIAL, AND SEMICONDUCTOR DEVICE | MITSUI CHEMICALS, INC. (JP) | 2018-11-22 | — | — | US | disclosed |
| EP-3379565-A1 | SEMICONDUCTOR FILM COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR FILM COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR MEMBER, METHOD FOR MANUFACTURING PROCESSING MATERIAL FOR SEMICONDUCTOR, AND SEMICONDUCTOR DEVICE | Mitsui Chemicals, Inc. (JP) | 2018-09-26 | — | — | EP | disclosed |
| US-20120177911-A1 | PREPREG | ASAHI KASEI E-MATERIALS CORPORATION (JP) | 2012-07-12 | — | — | US | disclosed |