Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAP3K14 | Q99558 | 1/20 | 0.39 |
| ▸ | CRBN | Q96SW2 | 6/20 | 0.37 |
| ▸ | DDB1 | Q16531 | 5/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.32 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.31 |
| ▸ | GLA | P06280 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | PKM | P14618 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1027078 | 0.81 | CRBN (0.50) | CRBNDDB1 | |
| SCHEMBL114367 | 0.81 | NPC1 (0.36) | MAP3K14CRBNDDB1GAATSHR | |
| SCHEMBL193688 | 0.80 | MAP3K14 (0.39) | MAP3K14CRBNDDB1CYP19A1LMNA | |
| SCHEMBL114517 | 0.79 | GLA (0.37) | MAP3K14CRBNDDB1GAATSHR | |
| SCHEMBL17065483 | 0.77 | NPC1 (0.37) | MAP3K14CRBNDDB1TSHRNPC1 | |
| SCHEMBL5855515 | 0.76 | MAP3K14 (0.39) | MAP3K14CRBNDDB1 | |
| SCHEMBL3381432 | 0.76 | MAP3K14 (0.35) | MAP3K14 | |
| SCHEMBL1034864 | 0.74 | — | — | |
| SCHEMBL8348991 | 0.73 | MAP3K14 (0.48) | MAP3K14CRBNDDB1GAATSHR | |
| SCHEMBL10754755 | 0.73 | MAP3K14 (0.48) | MAP3K14CRBNDDB1GAATSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2018160726-A1 | LOW DIELECTRIC CONSTANT POROUS EPOXY-BASED DIELECTRIC | GEORGIA TECH RESEARCH CORPORATION (US) | 2018-09-07 | — | — | WO | disclosed |
| US-9436084-B2 | Positive-working photoresist composition for thick film formation | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-09-06 | — | — | US | disclosed |
| EP-2510398-A2 | COMPOSITIONS COMPRISING BASE-REACTIVE COMPONENT AND PROCESSES FOR PHOTOLITHOGRAPHY | Rohm and Haas Electronic Materials LLC (US) | 2012-10-17 | — | — | EP | disclosed |
| WO-2011072307-A2 | COMPOSITIONS COMPRISING BASE-REACTIVE COMPONENT AND PROCESSES FOR PHOTOLITHOGRAPHY | ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. (US) | 2011-06-16 | — | — | WO | disclosed |
| EP-2273968-A1 | COMPOSITIONS AND METHODS INCORPORATING PHOTOCATALYSTS | THE PROCTER & GAMBLE COMPANY (US) | 2011-01-19 | — | — | EP | disclosed |
| EP-1861751-B1 | POSITIVE-WORKING PHOTORESIST COMPOSITION FOR THICK FILM FORMATION | TOKYO OHKA KOGYO CO LTD (JP) | 2010-11-24 | — | — | EP | disclosed |
| WO-2009140076-A1 | COMPOSITIONS AND METHODS INCORPORATING PHOTOCATALYSTS | THE PROCTER & GAMBLE COMPANY (US) | 2009-11-19 | — | — | WO | disclosed |
| US-20080026321-A1 | Positive-working photoresist composition for thick film formation | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-01-31 | — | — | US | disclosed |
| EP-1861751-A1 | POSITIVE-WORKING PHOTORESIST COMPOSITION FOR THICK FILM FORMATION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-12-05 | — | — | EP | disclosed |
| WO-2006101250-A1 | POSITIVE-WORKING PHOTORESIST COMPOSITION FOR THICK FILM FORMATION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-09-28 | — | — | WO | disclosed |
| US-6541179-B2 | A chemically amplified, positive resist comprising a sulfonium salt compound as photoacid generator, a base resin containing a monomer having alicyclic structure, and a solvent; heat treatment and exposure | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-04-01 | — | — | US | disclosed |
| US-20010033990-A1 | Resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-10-25 | — | — | US | disclosed |