⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10312432 | 0.87 | — | — | |
| SCHEMBL775940 | 0.82 | — | — | |
| SCHEMBL12764600 | 0.82 | — | — | |
| SCHEMBL10312408 | 0.82 | — | — | |
| SCHEMBL775676 | 0.81 | TGM2 (0.32) | — | |
| SCHEMBL775995 | 0.76 | ALDH1A1 (0.32) | — | |
| SCHEMBL776108 | 0.75 | — | — | |
| SCHEMBL7011429 | 0.74 | TSHR (0.35) | — | |
| SCHEMBL7011525 | 0.73 | TSHR (0.32) | — | |
| SCHEMBL7009736 | 0.72 | ZDHHC20 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8481243-B2 | Resin and photoresist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-07-09 | — | — | US | disclosed |
| US-20120178021-A1 | RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-07-12 | — | — | US | disclosed |