SCHEMBL103130

SCHEMBL103130

O=[N+]([O-])c1cccc2[nH]nnc12

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NOS1 P29475 4/20 0.51
MEN1 O00255 4/20 0.49
KMT2A Q03164 4/20 0.49
ALDH1A1 P00352 4/20 0.49
KDM4E B2RXH2 3/20 0.49
NOS2 P35228 3/20 0.49
TSHR P16473 3/20 0.49
CYP1A2 P05177 2/20 0.49
CYP3A4 P08684 2/20 0.49
MAPT P10636 2/20 0.49
CYP2C19 P33261 2/20 0.49
BLM P54132 2/20 0.49
CYP2D6 P10635 1/20 0.49
ALOX15 P16050 1/20 0.49
MAPK1 P28482 1/20 0.49
PKN1 Q16512 1/20 0.47
PKN2 Q16513 1/20 0.47
PDE10A Q9Y233 1/20 0.46
TXNRD1 Q16881 1/20 0.45
TXNRD3 Q86VQ6 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9168548 0.98 NOS1 (0.50) NOS1MEN1KMT2AALDH1A1KDM4E
Silver SCHEMBL9168531 0.98 NOS1 (0.50) NOS1MEN1KMT2AALDH1A1KDM4E
Benzotriazole SCHEMBL9452153 0.91 TXNRD1 (0.45) NOS1MEN1KMT2AALDH1A1KDM4E
SCHEMBL8431464 0.82 GPR35 (0.49) NOS1MEN1KMT2AALDH1A1KDM4E
SCHEMBL28821626 0.79 MGAM (0.46) NOS1MEN1KMT2AALDH1A1KDM4E
SCHEMBL11843467 0.78 NOS1 (0.47) NOS1MEN1KMT2AALDH1A1KDM4E
SCHEMBL3728212 0.77 TSHR (0.37) NOS1MEN1KMT2AALDH1A1KDM4E
SCHEMBL32679425 0.77 TSHR (0.37) NOS1MEN1KMT2AALDH1A1KDM4E
SCHEMBL11843474 0.76 PKN1 (0.51) NOS1MEN1KMT2AALDH1A1KDM4E
SCHEMBL6052169 0.76 GPR35 (0.44) NOS1MEN1KMT2AALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2920 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12590224-B2 Chemical mechanical polishing compositions and methods of use thereof FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2026-03-31 US claimed
EP-4647474-A2 CHEMICAL MECHANICAL POLISHING COMPOSITIONS AND METHODS OF USE THEREOF FUJIFILM Electronic Materials U.S.A., Inc. (US) 2025-11-12 EP claimed
US-20250297194-A1 CLEANING METHOD OF SEMICONDUCTOR DEVICE, CLEANING APPARATUS OF SEMICONDUCTOR DEVICE AND SEMICONDUCTOR CLEANING COMPOSITION DAXIN MATERIALS CORPORATION (TW) 2025-09-25 US claimed
EP-3774680-B1 CLEANING COMPOSITIONS FUJIFILM ELECTRONIC MAT USA INC (US) 2025-09-24 EP claimed
EP-4621829-A1 CLEANING METHOD OF SEMICONDUCTOR DEVICE, CLEANING APPARATUS OF SEMICONDUCTOR DEVICE AND SEMICONDUCTOR CLEANING COMPOSITION Daxin Materials Corporation (TW) 2025-09-24 EP claimed
CN-119571631-A High-toughness puncture-resistant tarpaulin material and preparation method thereof 江苏泽昊新材料有限公司 2025-03-07 CN claimed
CN-119505435-A Composite current collector containing PTC material and preparation method thereof 艾姆西艾(宿迁)电池技术有限公司 2025-02-25 CN claimed
US-12187984-B2 Treatment liquid and method for treating object to be treated FUJIFILM CORPORATION (JP) 2025-01-07 US claimed
CN-119242136-A Environment-friendly anti-seepage and compression-resistant high polymer coating special for water conservancy and preparation method thereof 中珀(秦皇岛)新材料科技有限公司 2025-01-03 CN claimed
US-12139693-B2 Treatment liquid and method for treating object to be treated FUJIFILM CORPORATION (JP) 2024-11-12 US claimed
EP-0737174-A1 LEAD-FREE PRIMING MIXTURE FOR PERCUSSION PRIMER OLIN CORPORATION (US) 1996-10-16 EP claimed
WO-1995015298-A1 LEAD-FREE PRIMING MIXTURE FOR PERCUSSION PRIMER OLIN CORPORATION (US) 1995-06-08 WO claimed
US-5417160-A Explosives OLIN CORPORATION (US) 1995-05-23 US claimed
EP-0215670-B1 ANTI-CORROSION COMPOSITION W.R. Grace & Co.-Conn. (US) 1990-03-14 EP claimed
EP-0131161-B1 HEAT-DEVELOPABLE COLOR PHOTOSENSITIVE ELEMENT KONICA CORPORATION (JP) 1988-11-02 EP claimed
US-4770989-A USING A THERMAL SOLVENT AND GELATIN/POLYVINYPYRROLIDONE POLYMER MIXTURE; DIFFUSION TRANSFER QUALITY IMAGE KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1988-09-13 US claimed
US-4649025-A HYDROXYPHOSPHONOACETIC ACID, AN AZOLE, AND A HYDROXYETHYLIDENE -1,1-DIPHOSPHONIC ACID W. R. GRACE & CO. (US) 1987-03-10 US claimed
EP-0131161-A2 Heat-developable color photosensitive element KONICA CORPORATION (JP) 1985-01-16 EP claimed
US-4343871-A GROUP IA METAL ANODE AND CATHODE FORMED OF ORGANIC COMPOUND HAVINGPI-ELECTRON CONJUGATED SYSTEM NIPPON TELEGRAPH & TELEPHONE PUBLIC CORPORATION (JP) 1982-08-10 US claimed
US-4188212-A BEZNOTRIAZOLE FUJI PHOTO FILM CO., LTD. (JP) 1980-02-12 US claimed